Inventor

COLBURN MATTHEW E

US158 patents

⚠️ This page may combine multiple inventors who share the name “COLBURN MATTHEW E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

COLBURN MATTHEW E

IBM

Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby

Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby

Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same

Grapho-epitaxy DSA process with dimension control of template pattern

Closed air gap interconnect structure

Device and methodology for reducing effective dielectric constant in semiconductor devices

Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics

Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same

Self aligned pattern formation post spacer etchback in tight pitch configurations

Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs

Self-aligned quadruple patterning process

Device and methodology for reducing effective dielectric constant in semiconductor devices

Structure for stochastic integrated circuit personalization

Method and materials for patterning a neutral surface

Method for improved process latitude by elongated via integration

Robust ultra-low k interconnect structures using bridge-then-metallization fabrication sequence

Method and apparatus for direct referencing of top surface of workpiece during imprint lithography

Chemical trim of photoresist lines by means of a tuned overcoat material

Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning

Method of forming closed air gap interconnects and structures formed thereby

Method of forming closed air gap interconnects and structures formed thereby

DSA grapho-epitaxy process with etch stop material

Selective thin metal cap process

Interconnect structures with engineered dielectrics with nanocolumnar porosity

Self aligned pattern formation post spacer etchback in tight pitch configurations

Method and structure for cut material selection

Self aligned conductive lines with relaxed overlay

Integration of dense and variable pitch fin structures

Integration of dense and variable pitch fin structures

FACEBOOK TECH LLC

Fabrication of self-aligned grating elements with high refractive index for waveguide displays

Gratings with variable depths formed using planarization for waveguide displays

Diffraction grating with a variable refractive index using multiple resins

High refractive index gratings for waveguide displays manufactured by self-aligned stacked process

Gray-tone electron-beam lithography

Nanoimprint lithography system and method

Diffraction grating with a variable refractive index formed using an energy gradient

Diffraction grating with a variable refractive index using ion implantation

Gratings with variable etch heights for waveguide displays

Corrective optics for reducing fixed pattern noise in head mounted displays

UNIV TEXAS

Imprint lithography template having a feature size under 250 nm

Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks

Method of determining alignment of a template and a substrate having a liquid disposed therebetween

ARNOLD JOHN C

Sidewall image transfer process employing a cap material layer for a metal nitride layer

Mask and etch process for pattern assembly

Tone inversion with partial underlayer etch for semiconductor device formation

META PLATFORMS TECH LLC

Gratings with variable depths formed using planarization for waveguide displays

In-field illumination for eye tracking

EDELSTEIN DANIEL C

Reducing effective dielectric constant in semiconductor devices

YIN YUNPENG

Sidewall image transfer process

CHENG JOY

Methods of directed self-assembly, and layered structures formed therefrom