Inventor
LAXMAN RAVI K
US15 patents
⚠️ This page may combine multiple inventors who share the name “LAXMAN RAVI K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED TECH MATERIALS
8 patentsUS7531679B2May 12, 2009
Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride
ADVANCED TECH MATERIALS55 citations97
US7910765B2Mar 22, 2011
Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
ADVANCED TECH MATERIALS19 citations92
US7786320B2Aug 31, 2010
Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
ADVANCED TECH MATERIALS29 citations92
US7556244B2Jul 7, 2009
Method and apparatus to help promote contact of gas with vaporized material
ADVANCED TECH MATERIALS28 citations92
US7487956B2Feb 10, 2009
Method and apparatus to help promote contact of gas with vaporized material
ADVANCED TECH MATERIALS27 citations92
US7108771B2Sep 19, 2006
Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films
ADVANCED TECH MATERIALS24 citations90
US9004462B2Apr 14, 2015
Method and apparatus to help promote contact of gas with vaporized material
ADVANCED TECH MATERIALS9 citations84
US7423166B2Sep 9, 2008
Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films
ADVANCED TECH MATERIALS8 citations73