Inventor
INASAKI TAKESHI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “INASAKI TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
10 patentsUS9826129B2Nov 21, 2017
Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method therefor
FUJIFILM CORP2 citations72
US9235116B2Jan 12, 2016
Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
FUJIFILM CORP3 citations72
US11294279B2Apr 5, 2022
Lithographic printing plate precursor, and method for producing lithographic printing plate
FUJIFILM CORP2 citations69
US9563121B2Feb 7, 2017
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
FUJIFILM CORP0 citations51
US9235120B2Jan 12, 2016
Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask
FUJIFILM CORP0 citations51
US9091927B2Jul 28, 2015
Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
FUJIFILM CORP0 citations51
US11117364B2Sep 14, 2021
Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound
FUJIFILM CORP0 citations50
US10921712B2Feb 16, 2021
Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and color developing compound
FUJIFILM CORP0 citations50
US9285679B2Mar 15, 2016
Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition
FUJIFILM CORP0 citations50
US11543750B2Jan 3, 2023
Lithographic printing plate precursor and method for producing lithographic printing plate
FUJIFILM CORP0 citations48
INASAKI TAKESHI
3 patentsUS8735048B2May 27, 2014
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
INASAKI TAKESHI4 citations69
US8673538B2Mar 18, 2014
Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
INASAKI TAKESHI3 citations60
US8574814B2Nov 5, 2013
Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
INASAKI TAKESHI0 citations39
ITO TAKAYUKI
2 patentsUS8329379B2Dec 11, 2012
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
ITO TAKAYUKI6 citations72
US9223204B2Dec 29, 2015
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
ITO TAKAYUKI0 citations41
TSUCHIMURA TOMOTAKA
2 patentsUS8614033B2Dec 24, 2013
Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition
TSUCHIMURA TOMOTAKA0 citations51
US8895222B2Nov 25, 2014
Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
TSUCHIMURA TOMOTAKA0 citations41