Inventor

YATSUO TADATERU

JP7 patents

⚠️ This page may combine multiple inventors who share the name “YATSUO TADATERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIFILM CORP

3 patents

US9625813B2Apr 18, 2017

Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound

FUJIFILM CORP1 citations50

US10007180B2Jun 26, 2018

Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film

FUJIFILM CORP0 citations39

US9034560B2May 19, 2015

Negative resist composition and pattern forming method using the same

FUJIFILM CORP0 citations39

TSUCHIHASHI TORU

2 patents

US8637222B2Jan 28, 2014

Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern

TSUCHIHASHI TORU4 citations70

US8889339B2Nov 18, 2014

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

TSUCHIHASHI TORU2 citations59

INASAKI TAKESHI

1 patent

US8735048B2May 27, 2014

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method

INASAKI TAKESHI4 citations69

TSUCHIMURA TOMOTAKA

1 patent

US8778593B2Jul 15, 2014

Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition

TSUCHIMURA TOMOTAKA0 citations39