Inventor
TAKAHASHI KOUTAROU
JP11 patents
⚠️ This page may combine multiple inventors who share the name “TAKAHASHI KOUTAROU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
9 patentsUS10120281B2Nov 6, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP6 citations72
US10139727B2Nov 27, 2018
Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device
FUJIFILM CORP1 citations51
US9904168B2Feb 27, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP1 citations51
US9285679B2Mar 15, 2016
Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition
FUJIFILM CORP0 citations50
US10545405B2Jan 28, 2020
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations41
US10526266B2Jan 7, 2020
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound
FUJIFILM CORP0 citations41
US10324374B2Jun 18, 2019
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound
FUJIFILM CORP0 citations41
US10011576B2Jul 3, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
FUJIFILM CORP0 citations41
US9316908B2Apr 19, 2016
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern
FUJIFILM CORP0 citations39