Inventor
AGGARWAL TANUJ
US14 patents
⚠️ This page may combine multiple inventors who share the name “AGGARWAL TANUJ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
Cymer LLC
13 patentsUS9634455B1Apr 25, 2017
Gas optimization in a gas discharge light source
Cymer LLC9 citations82
US10096969B1Oct 9, 2018
Method for dither free adaptive and robust dose control for photolithography
Cymer LLC2 citations71
US9939732B2Apr 10, 2018
Controller for an optical system
Cymer LLC2 citations71
US9819136B2Nov 14, 2017
Gas mixture control in a gas discharge light source
Cymer LLC5 citations71
US9762023B2Sep 12, 2017
Online calibration for repetition rate dependent performance variables
Cymer LLC3 citations71
US11769982B2Sep 26, 2023
Lithography system bandwidth control
Cymer LLC0 citations61
US10892594B2Jan 12, 2021
Gas optimization in a gas discharge light source
Cymer LLC0 citations61
US11050213B2Jun 29, 2021
Online calibration for repetition rate dependent performance variables
Cymer LLC0 citations60
US10833471B2Nov 10, 2020
Lithography system bandwidth control
Cymer LLC0 citations50
US10727642B2Jul 28, 2020
Online calibration for repetition rate dependent performance variables
Cymer LLC0 citations50
US10218147B2Feb 26, 2019
Gas optimization in a gas discharge light source
Cymer LLC0 citations50
US10090629B2Oct 2, 2018
Gas mixture control in a gas discharge light source
Cymer LLC0 citations50
US10036963B2Jul 31, 2018
Estimating a gain relationship of an optical source
Cymer LLC0 citations40