Inventor
BLOMILEY ERIC R
US20 patents
⚠️ This page may combine multiple inventors who share the name “BLOMILEY ERIC R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
18 patentsUS7557002B2Jul 7, 2009
Methods of forming transistor devices
MICRON TECHNOLOGY INC40 citations96
US7956416B2Jun 7, 2011
Integrated circuitry
MICRON TECHNOLOGY INC23 citations92
US7531395B2May 12, 2009
Methods of forming a layer comprising epitaxial silicon, and methods of forming field effect transistors
MICRON TECHNOLOGY INC22 citations92
US7528424B2May 5, 2009
Integrated circuitry
MICRON TECHNOLOGY INC15 citations92
US9972628B1May 15, 2018
Conductive structures, wordlines and transistors
MICRON TECHNOLOGY INC7 citations84
US8035129B2Oct 11, 2011
Integrated circuitry
MICRON TECHNOLOGY INC5 citations74
US7276416B2Oct 2, 2007
Method of forming a vertical transistor
MICRON TECHNOLOGY INC6 citations74
US7144779B2Dec 5, 2006
Method of forming epitaxial silicon-comprising material
MICRON TECHNOLOGY INC9 citations74
US7132355B2Nov 7, 2006
Method of forming a layer comprising epitaxial silicon and a field effect transistor
MICRON TECHNOLOGY INC10 citations74
US7768036B2Aug 3, 2010
Integrated circuitry
MICRON TECHNOLOGY INC1 citations63
US7662649B2Feb 16, 2010
Methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses
MICRON TECHNOLOGY INC5 citations63
US7585371B2Sep 8, 2009
Substrate susceptors for receiving semiconductor substrates to be deposited upon
MICRON TECHNOLOGY INC2 citations63
US7517758B2Apr 14, 2009
Method of forming a vertical transistor
MICRON TECHNOLOGY INC3 citations63
US6987055B2Jan 17, 2006
Methods for deposition of semiconductor material
MICRON TECHNOLOGY INC3 citations63
US6911367B2Jun 28, 2005
Methods of forming semiconductive materials having flattened surfaces; methods of forming isolation regions; and methods of forming elevated source/drain regions
MICRON TECHNOLOGY INC5 citations63
US10147727B2Dec 4, 2018
Conductive structures, wordlines and transistors
MICRON TECHNOLOGY INC1 citations52
US7439136B2Oct 21, 2008
Method of forming a layer comprising epitaxial silicon
MICRON TECHNOLOGY INC0 citations52
US7253085B2Aug 7, 2007
Deposition methods
MICRON TECHNOLOGY INC0 citations52