Inventor
DUBIN VALERY M
US88 patents
⚠️ This page may combine multiple inventors who share the name “DUBIN VALERY M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
40 patentsUS6645567B2Nov 11, 2003
Electroless plating bath composition and method of using
INTEL CORP85 citations98
US6958547B2Oct 25, 2005
Interconnect structures containing conductive electrolessly deposited etch stop layers, liner layers, and via plugs
INTEL CORP71 citations97
US7276801B2Oct 2, 2007
Designs and methods for conductive bumps
INTEL CORP56 citations96
US7049234B2May 23, 2006
Multiple stage electroless deposition of a metal layer
INTEL CORP37 citations96
US6977224B2Dec 20, 2005
Method of electroless introduction of interconnect structures
INTEL CORP50 citations96
US6933222B2Aug 23, 2005
Microcircuit fabrication and interconnection
INTEL CORP53 citations96
US6696758B2Feb 24, 2004
Interconnect structures and a method of electroless introduction of interconnect structures
INTEL CORP57 citations96
US7008872B2Mar 7, 2006
Use of conductive electrolessly deposited etch stop layers, liner layers and via plugs in interconnect structures
INTEL CORP59 citations95
US6518184B1Feb 11, 2003
Enhancement of an interconnect
INTEL CORP61 citations94
US7476967B2Jan 13, 2009
Composite carbon nanotube thermal interface device
INTEL CORP15 citations93
US7470620B2Dec 30, 2008
Microcircuit fabrication and interconnection
INTEL CORP26 citations93
US7348675B2Mar 25, 2008
Microcircuit fabrication and interconnection
INTEL CORP35 citations93
US7112472B2Sep 26, 2006
Methods of fabricating a composite carbon nanotube thermal interface device
INTEL CORP28 citations93
US6432821B1Aug 13, 2002
Method of copper electroplating
INTEL CORP145 citations93
US7964174B2Jun 21, 2011
Nanotube growth and device formation
INTEL CORP29 citations92
US7682891B2Mar 23, 2010
Tunable gate electrode work function material for transistor applications
INTEL CORP19 citations92
US7586196B2Sep 8, 2009
Apparatus for an improved air gap interconnect structure
INTEL CORP16 citations92
US7285494B2Oct 23, 2007
Multiple stage electroless deposition of a metal layer
INTEL CORP19 citations92
US7279423B2Oct 9, 2007
Forming a copper diffusion barrier
INTEL CORP26 citations92
US7262504B2Aug 28, 2007
Multiple stage electroless deposition of a metal layer
INTEL CORP26 citations92
US7223695B2May 29, 2007
Methods to deposit metal alloy barrier layers
INTEL CORP18 citations92
US7149085B2Dec 12, 2006
Electroosmotic pump apparatus that generates low amount of hydrogen gas
INTEL CORP20 citations92
US7118941B2Oct 10, 2006
Method of fabricating a composite carbon nanotube thermal interface device
INTEL CORP28 citations92
US6843852B2Jan 18, 2005
Apparatus and method for electroless spray deposition
INTEL CORP20 citations89
US7847394B2Dec 7, 2010
Packaging of integrated circuits with carbon nanotube arrays to enhance heat dissipation through a thermal interface
INTEL CORP10 citations84
US7635503B2Dec 22, 2009
Composite metal films and carbon nanotube fabrication
INTEL CORP16 citations84
US7633080B2Dec 15, 2009
Method to assemble structures from nano-materials
INTEL CORP12 citations84
US7316061B2Jan 8, 2008
Packaging of integrated circuits with carbon nano-tube arrays to enhance heat dissipation through a thermal interface
INTEL CORP10 citations84
US7304388B2Dec 4, 2007
Method and apparatus for an improved air gap interconnect structure
INTEL CORP10 citations84
US7300860B2Nov 27, 2007
Integrated circuit with metal layer having carbon nanotubes and methods of making same
INTEL CORP15 citations84
US7208327B2Apr 24, 2007
Metal oxide sensors and method of forming
INTEL CORP14 citations84
US7192856B2Mar 20, 2007
Forming dual metal complementary metal oxide semiconductor integrated circuits
INTEL CORP13 citations84
US7122461B2Oct 17, 2006
Method to assemble structures from nano-materials
INTEL CORP14 citations84
US7105851B2Sep 12, 2006
Nanotubes for integrated circuits
INTEL CORP17 citations84
US7338585B2Mar 4, 2008
Electroplating chemistries and methods of forming interconnections
INTEL CORP12 citations82
US7135775B2Nov 14, 2006
Enhancement of an interconnect
INTEL CORP12 citations82
US7087517B2Aug 8, 2006
Method to fabricate interconnect structures
INTEL CORP11 citations82
US10035147B2Jul 31, 2018
Wafer with gel-based biochips for electrochemical synthesis and electrical detection of polymers
INTEL CORP5 citations80
US7365011B2Apr 29, 2008
Catalytic nucleation monolayer for metal seed layers
INTEL CORP12 citations80
US7704791B2Apr 27, 2010
Packaging of integrated circuits with carbon nano-tube arrays to enhance heat dissipation through a thermal interface
INTEL CORP7 citations74
CORNELL RES FOUNDATION INC
4 patentsUS5830805ANov 3, 1998
Electroless deposition equipment or apparatus and method of performing electroless deposition
CORNELL RES FOUNDATION INC358 citations99
US5891513AApr 6, 1999
Electroless CU deposition on a barrier layer by CU contact displacement for ULSI applications
CORNELL RES FOUNDATION INC582 citations98
US5695810ADec 9, 1997
Use of cobalt tungsten phosphide as a barrier material for copper metallization
CORNELL RES FOUNDATION INC833 citations97
US5824599AOct 20, 1998
Protected encapsulation of catalytic layer for electroless copper interconnect
CORNELL RES FOUNDATION INC561 citations96
ADVANCED MICRO DEVICES INC
2 patentsUS6077780AJun 20, 2000
Method for filling high aspect ratio openings of an integrated circuit to minimize electromigration failure
ADVANCED MICRO DEVICES INC403 citations99
US6001415ADec 14, 1999
Via with barrier layer for impeding diffusion of conductive material from via into insulator
ADVANCED MICRO DEVICES INC42 citations93
SEMATECH INC
1 patentLU DAOQIANG
1 patentLAVOIE ADRIEN R
1 patentDUBIN VALERY M
1 patentShowing the top 50 of 88 patents by PatentIndex Score.