Inventor
NUMASAWA YOICHIRO
JP12 patents
⚠️ This page may combine multiple inventors who share the name “NUMASAWA YOICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ANELVA CORP
8 patentsUS6083361AJul 4, 2000
Sputter device
ANELVA CORP35 citations92
US6070552AJun 6, 2000
Substrate processing apparatus
ANELVA CORP26 citations92
US6059985AMay 9, 2000
Method of processing a substrate and apparatus for the method
ANELVA CORP37 citations92
US7091138B2Aug 15, 2006
Forming method and a forming apparatus of nanocrystalline silicon structure
ANELVA CORP15 citations83
US6664496B2Dec 16, 2003
Plasma processing system
ANELVA CORP13 citations83
US6016765AJan 25, 2000
Plasma processing apparatus
ANELVA CORP7 citations73
US5956616ASep 21, 1999
Method of depositing thin films by plasma-enhanced chemical vapor deposition
ANELVA CORP12 citations73
US7589002B2Sep 15, 2009
Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method
ANELVA CORP2 citations60
CANON ANELVA CORP
2 patentsUS7666763B2Feb 23, 2010
Nanosilicon semiconductor substrate manufacturing method and semiconductor circuit device using nanosilicon semiconductor substrate manufactured by the method
CANON ANELVA CORP4 citations61
US7530359B2May 12, 2009
Plasma treatment system and cleaning method of the same
CANON ANELVA CORP4 citations61