Inventor
IEKI TOSHIHIDE
JP5 patents
Patents
5 patentsUS7488683B2Feb 10, 2009
Chemical vapor deposited film based on a plasma CVD method and method of forming the film
TOYO SEIKAN KAISHA LTD54 citations96
US6818310B2Nov 16, 2004
Silicon oxide film
TOYO SEIKAN KAISHA LTD62 citations94
US6582778B2Jun 24, 2003
Method of treatment with a microwave plasma
TOYO SEIKAN KAISHA LTD37 citations92
US7847209B2Dec 7, 2010
Method of forming a metal oxide film and microwave power source device used for the above method
TOYO SEIKAN KAISHA LTD3 citations62
US7906217B2Mar 15, 2011
Vapor deposited film by plasma CVD method
TOYO SEIKAN KAISHA LTD4 citations54