Inventor

KOMORIYA HARUHIKO

JP57 patents

⚠️ This page may combine multiple inventors who share the name “KOMORIYA HARUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOMORIYA HARUHIKO

CENTRAL GLASS CO LTD

Coated granular fertilizer and method for producing same

Coated granular fertilizer and method for producing same

Polymers, resist compositions and patterning process

Top coat composition

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method

Polymerizable ester compounds

Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Esters, polymers, resist compositions and patterning process

Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same

Transparent fluorine-containing copolymer

Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same

Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same

Polymer, resist composition, and patterning process

Sulfonates, polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Aromatic polyamide from 2,2&#39;-bis(4-(4-amino-phenoxy)phenyl)hexafluoro propane

Method of preparing soluble aromatic polyimides and varnish compositions using same

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

Transparent fluorine-containing copolymer

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern

Polymers, resist compositions and patterning process

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same

Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers

Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers

Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

SHINETSU CHEMICAL CO

Polymer, resist protective coating material, and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Ester compound, polymer, resist composition, and patterning process

Resist protective coating material and patterning process

Polymer, resist composition and patterning process

Chemically amplified resist compositions and patterning process

Ester compounds

KOMORIYA HARUHIKO

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

Top coat composition

Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern

TERUI YOSHIHARU

Fluorine-containing polymer and anti-static agent wherein same is used

Positive-type resist composition

PANASONIC CORP

Polymer, resist composition and patterning process

MAEDA KAZUHIKO

Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern

SUMIDA SHINICHI

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

TANAKA TORU

Proton conducting polymer membrane, membrane-electrode assembly using same, and polymer electrolyte fuel cell

Aromatic polyamide from 2,2'-bis(4-(4-amino-phenoxy)phenyl)hexafluoro propane