Inventor
BABICH KATHERINA E
US26 patents
⚠️ This page may combine multiple inventors who share the name “BABICH KATHERINA E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
20 patentsUS6815329B2Nov 9, 2004
Multilayer interconnect structure containing air gaps and method for making
IBM105 citations97
US6686124B1Feb 3, 2004
Multifunctional polymeric materials and use thereof
IBM67 citations96
US6428894B1Aug 6, 2002
Tunable and removable plasma deposited antireflective coatings
IBM146 citations96
US7361444B1Apr 22, 2008
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM22 citations92
US7098476B2Aug 29, 2006
Multilayer interconnect structure containing air gaps and method for making
IBM39 citations92
US7030008B2Apr 18, 2006
Techniques for patterning features in semiconductor devices
IBM14 citations91
US6251569B1Jun 26, 2001
Forming a pattern of a negative photoresist
IBM23 citations91
US7326442B2Feb 5, 2008
Antireflective composition and process of making a lithographic structure
IBM11 citations84
US7077903B2Jul 18, 2006
Etch selectivity enhancement for tunable etch resistant anti-reflective layer
IBM9 citations74
US7709177B2May 4, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM7 citations73
US6617086B2Sep 9, 2003
Forming a pattern of a negative photoresist
IBM5 citations72
US6858357B2Feb 22, 2005
Attenuated embedded phase shift photomask blanks
IBM5 citations71
US6653027B2Nov 25, 2003
Attenuated embedded phase shift photomask blanks
IBM12 citations71
US7175966B2Feb 13, 2007
Water and aqueous base soluble antireflective coating/hardmask materials
IBM9 citations70
US7736833B2Jun 15, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM3 citations62
US7545041B2Jun 9, 2009
Techniques for patterning features in semiconductor devices
IBM4 citations61
US7968270B2Jun 28, 2011
Process of making a semiconductor device using multiple antireflective materials
IBM0 citations52
US7790593B2Sep 7, 2010
Method for tuning epitaxial growth by interfacial doping and structure including same
IBM0 citations52
US7485573B2Feb 3, 2009
Process of making a semiconductor device using multiple antireflective materials
IBM1 citations52
US7329596B2Feb 12, 2008
Method for tuning epitaxial growth by interfacial doping and structure including same
IBM0 citations52
BABICH KATHERINA E
3 patentsUS8497212B2Jul 30, 2013
Filling narrow openings using ion beam etch
BABICH KATHERINA E15 citations82
US8754530B2Jun 17, 2014
Self-aligned borderless contacts for high density electronic and memory device integration
BABICH KATHERINA E3 citations61
US9099537B2Aug 4, 2015
Selective nanotube growth inside vias using an ion beam
BABICH KATHERINA E0 citations47