Inventor
SHIONO DAIJU
JP65 patents
⚠️ This page may combine multiple inventors who share the name “SHIONO DAIJU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
22 patentsUS7504196B2Mar 17, 2009
Positive resist composition, method for resist pattern formation and compound
TOKYO OHKA KOGYO CO LTD21 citations92
US7604920B2Oct 20, 2009
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
TOKYO OHKA KOGYO CO LTD10 citations84
US8685620B2Apr 1, 2014
Resist composition, method of forming resist pattern and polymeric compound
TOKYO OHKA KOGYO CO LTD8 citations83
US9169421B2Oct 27, 2015
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
TOKYO OHKA KOGYO CO LTD7 citations82
US9816003B2Nov 14, 2017
Method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD2 citations72
US9366960B2Jun 14, 2016
Negative resist composition, method of forming resist pattern, and complex
TOKYO OHKA KOGYO CO LTD2 citations63
US8846838B2Sep 30, 2014
Fluorine-containing block copolymeric compound
TOKYO OHKA KOGYO CO LTD2 citations63
US8021823B2Sep 20, 2011
Positive resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD5 citations63
US7851129B2Dec 14, 2010
Resist composition, resist pattern forming method and compound
TOKYO OHKA KOGYO CO LTD2 citations63
US9442371B2Sep 13, 2016
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US8778595B2Jul 15, 2014
Resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD2 citations62
US7723007B2May 25, 2010
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
TOKYO OHKA KOGYO CO LTD5 citations62
US9499646B2Nov 22, 2016
Negative resist composition, method of forming resist pattern and complex
TOKYO OHKA KOGYO CO LTD1 citations52
US9023580B2May 5, 2015
Method of forming polymeric compound, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US7943284B2May 17, 2011
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US7923192B2Apr 12, 2011
Base material for pattern-forming material, positive resist composition and method of resist pattern formation
TOKYO OHKA KOGYO CO LTD1 citations52
US7919651B2Apr 5, 2011
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
TOKYO OHKA KOGYO CO LTD0 citations52
US7901865B2Mar 8, 2011
Resist composition and process for formation of resist patterns
TOKYO OHKA KOGYO CO LTD1 citations52
US7862981B2Jan 4, 2011
Compound, positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD1 citations52
US9133102B2Sep 15, 2015
Resist composition, method of forming resist pattern and polymeric compound
TOKYO OHKA KOGYO CO LTD0 citations51
US8367296B2Feb 5, 2013
Positive resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD0 citations42
US8017300B2Sep 13, 2011
Compound, positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations42
HIRANO TOMOYUKI
7 patentsUS8394578B2Mar 12, 2013
Method of forming resist pattern and negative tone-development resist composition
HIRANO TOMOYUKI9 citations84
US8329378B2Dec 11, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
HIRANO TOMOYUKI9 citations84
US8440385B2May 14, 2013
Positive resist composition, method of forming resist pattern and polymeric compound
HIRANO TOMOYUKI5 citations73
US8980524B2Mar 17, 2015
Positive resist composition and method of forming resist pattern
HIRANO TOMOYUKI2 citations62
US8632960B2Jan 21, 2014
Method of forming resist pattern and negative tone-development resist composition
HIRANO TOMOYUKI2 citations62
US8911928B2Dec 16, 2014
Resist composition, method of forming resist pattern, polymeric compound and method of producing the same
HIRANO TOMOYUKI0 citations51
US9250531B2Feb 2, 2016
Method of forming resist pattern and negative tone-development resist composition
HIRANO TOMOYUKI0 citations50
DAZAI TAKAHIRO
6 patentsUS8192915B2Jun 5, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO21 citations92
US8232041B2Jul 31, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO12 citations84
US8182976B2May 22, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO13 citations84
US8268529B2Sep 18, 2012
Positive resist composition, method of forming resist pattern using the same, and polymeric compound
DAZAI TAKAHIRO9 citations83
US8227170B2Jul 24, 2012
Resist composition, method of forming resist pattern, polymeric compound, and compound
DAZAI TAKAHIRO11 citations83
US8541529B2Sep 24, 2013
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO3 citations62
SHIONO DAIJU
5 patentsUS8221956B2Jul 17, 2012
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
SHIONO DAIJU20 citations91
US8642244B2Feb 4, 2014
Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
SHIONO DAIJU3 citations61
US8475997B2Jul 2, 2013
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
SHIONO DAIJU2 citations61
US8742038B2Jun 3, 2014
Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
SHIONO DAIJU0 citations51
US8304163B2Nov 6, 2012
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
SHIONO DAIJU0 citations51
MATSUMIYA TASUKU
3 patentsUS8236477B2Aug 7, 2012
Positive resist composition and method of forming resist pattern
MATSUMIYA TASUKU7 citations82
US8487056B2Jul 16, 2013
Positive resist composition and method of forming resist pattern
MATSUMIYA TASUKU4 citations61
US8404428B2Mar 26, 2013
Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound
MATSUMIYA TASUKU3 citations61
KAWAUE AKIYA
1 patentTSUCHIYA JUNICHI
1 patentSHIMIZU HIROAKI
1 patentTAKAKI DAICHI
1 patentARAI MASATOSHI
1 patentABE SHO
1 patentHITACHI LTD
1 patentShowing the top 50 of 65 patents by PatentIndex Score.