Inventor

DAZAI TAKAHIRO

JP53 patents

⚠️ This page may combine multiple inventors who share the name “DAZAI TAKAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DAZAI TAKAHIRO

TOKYO OHKA KOGYO CO LTD

Polymer compound, positive resist composition, and method of forming resist pattern

Resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, polymeric compound, and compound

Resist composition, method of forming resist pattern and polymeric compound

Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

Method of producing structure containing phase-separated structure and method of forming top coat film

Undercoat agent and method of producing structure containing phase-separated structure

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Fluorine-containing block copolymeric compound

Positive resist composition, method of forming resist pattern, and polymeric compound

Method of producing structure containing phase-separated structure

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

Positive resist composition and method of forming resist pattern

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Method of forming resist pattern

Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern

Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern

Method of forming polymeric compound, resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, polymeric compound, and compound

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern

Polymer compound, positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric compound and compound

Resist composition and method for forming resist pattern

DAZAI TAKAHIRO

Positive resist composition, method of forming resist pattern, and polymeric compound

Positive resist composition, method of forming resist pattern, and polymeric compound

Positive resist composition, method of forming resist pattern, and polymeric compound

Positive resist composition, method of forming resist pattern using the same, and polymeric compound

Resist composition, method of forming resist pattern, polymeric compound, and compound

Positive resist composition, method of forming resist pattern, and polymeric compound

Polymer compound, positive resist composition, and method of forming resist pattern

SHIONO DAIJU

Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound

Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound

Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound

HIRANO TOMOYUKI

Method of forming resist pattern and negative tone-development resist composition

Positive resist composition, method of forming resist pattern, and polymeric compound

Method of forming resist pattern and negative tone-development resist composition

MATSUMIYA TASUKU

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound

SHIMIZU HIROAKI

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, and polymeric compound

SESHIMO TAKEHIRO

Positive resist composition and method of forming resist pattern

SENZAKI TAKAHIRO

Primer and pattern forming method for layer including block copolymer

UTSUMI YOSHIYUKI

Method of producing polymeric compound, resist composition, and method of forming resist pattern

FURUYA SANAE

Polymeric compound, positive resist composition, and method of forming resist pattern

FUJIKAWA SHIGENORI

Substrate provided with metal nanostructure on surface thereof and method of producing the same

ABE SHO

Negative resist composition, method of forming resist pattern and polymeric compound