Inventor
HATAKEYAMA Naoya
JP17 patents
⚠️ This page may combine multiple inventors who share the name “HATAKEYAMA Naoya”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
OLYMPUS CORP
8 patentsUS10085624B2Oct 2, 2018
Manipulator and manipulator system
OLYMPUS CORP989 citations97
US10155316B2Dec 18, 2018
Manipulator-calibrating method, manipulator, and manipulator system
OLYMPUS CORP7 citations83
US9878449B2Jan 30, 2018
Manipulator system
OLYMPUS CORP3 citations72
US9585720B2Mar 7, 2017
Medical manipulator and treatment tool replacement method
OLYMPUS CORP2 citations72
US9550293B2Jan 24, 2017
Manipulator
OLYMPUS CORP3 citations72
US10863883B2Dec 15, 2020
Medical system and treatment tool calibrating method
OLYMPUS CORP1 citations61
US10449009B2Oct 22, 2019
Medical system
OLYMPUS CORP0 citations40
US10085612B2Oct 2, 2018
Manipulator and manipulator system
OLYMPUS CORP0 citations40
FUJIFILM CORP
8 patentsUS11281103B2Mar 22, 2022
Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device
FUJIFILM CORP2 citations72
US10859914B2Dec 8, 2020
Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development
FUJIFILM CORP3 citations72
US11835849B2Dec 5, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations62
US11687001B2Jun 27, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP1 citations62
US11150557B2Oct 19, 2021
Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film
FUJIFILM CORP0 citations62
US10923769B2Feb 16, 2021
Electrolytic solution for non-aqueous secondary battery and non-aqueous secondary battery
FUJIFILM CORP0 citations51
US12510824B2Dec 30, 2025
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations50
US9862605B2Jan 9, 2018
Nitrogen-containing carbon alloy, method for producing same, carbon alloy catalyst, and fuel cell
FUJIFILM CORP0 citations41