Inventor
NAGAI HIROKO
JP7 patents
Patents
7 patentsUS10416563B2Sep 17, 2019
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
SHINETSU CHEMICAL CO4 citations72
US10241412B2Mar 26, 2019
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
SHINETSU CHEMICAL CO3 citations72
US11022882B2Jun 1, 2021
Compound and composition for forming organic film
SHINETSU CHEMICAL CO1 citations61
US10604618B2Mar 31, 2020
Compound, method for manufacturing the compound, and composition for forming organic film
SHINETSU CHEMICAL CO1 citations61
US10514605B2Dec 24, 2019
Resist multilayer film-attached substrate and patterning process
SHINETSU CHEMICAL CO1 citations61
US11042090B2Jun 22, 2021
Composition for forming organic film
SHINETSU CHEMICAL CO0 citations51
US11307497B2Apr 19, 2022
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO0 citations50