Inventor

MATSUMURA NOBUJI

JP11 patents

⚠️ This page may combine multiple inventors who share the name “MATSUMURA NOBUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JSR CORP

3 patents

US8361691B2Jan 29, 2013

Radiation-sensitive composition and process for producing low-molecular compound for use therein

JSR CORP2 citations61

US8808974B2Aug 19, 2014

Method for forming pattern

JSR CORP2 citations59

US8771923B2Jul 8, 2014

Radiation-sensitive composition

JSR CORP0 citations51

SUGITA HIKARU

2 patents

US8119324B2Feb 21, 2012

Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film

SUGITA HIKARU5 citations70

US8450045B2May 28, 2013

Pattern forming method

SUGITA HIKARU0 citations48

MATSUMURA NOBUJI

2 patents

US8507575B2Aug 13, 2013

Radiation-sensitive resin composition, polymer, and compound

MATSUMURA NOBUJI7 citations67

US8530692B2Sep 10, 2013

Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound

MATSUMURA NOBUJI0 citations36

SAKAKIBARA HIROKAZU

1 patent

US8697331B2Apr 15, 2014

Compound, polymer, and radiation-sensitive composition

SAKAKIBARA HIROKAZU2 citations59

NAGAI TOMOKI

1 patent

US8273837B2Sep 25, 2012

Compound, polymer, and resin composition

NAGAI TOMOKI1 citations44

SHIMIZU DAISUKE

1 patent

US8173348B2May 8, 2012

Method of forming pattern and composition for forming of organic thin-film for use therein

SHIMIZU DAISUKE0 citations40

SERIZAWA RYUICHI

1 patent

US8921027B2Dec 30, 2014

Radiation-sensitive resin composition

SERIZAWA RYUICHI0 citations30