Inventor
SHIMOKAWA TSUTOMU
JP38 patents
⚠️ This page may combine multiple inventors who share the name “SHIMOKAWA TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
28 patentsUS6531260B2Mar 11, 2003
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
JSR CORP54 citations96
US7897821B2Mar 1, 2011
Sulfonium compound
JSR CORP15 citations92
US7812105B2Oct 12, 2010
Compound, polymer, and radiation-sensitive composition
JSR CORP25 citations92
US7288359B2Oct 30, 2007
Radiation-sensitive resin composition
JSR CORP33 citations92
US7244549B2Jul 17, 2007
Pattern forming method and bilayer film
JSR CORP30 citations92
US7108955B2Sep 19, 2006
Polysiloxane, process for production thereof and radiation-sensitive resin composition
JSR CORP20 citations92
US7037994B2May 2, 2006
Acenaphthylene derivative, polymer, and antireflection film-forming composition
JSR CORP32 citations92
US6933094B2Aug 23, 2005
Radiation-sensitive resin composition
JSR CORP17 citations92
US6800414B2Oct 5, 2004
Radiation-sensitive resin composition
JSR CORP35 citations92
US6299785B1Oct 9, 2001
Electrode formation process
JSR CORP24 citations92
US6753124B2Jun 22, 2004
Radiation-sensitive resin composition
JSR CORP33 citations91
US6623907B2Sep 23, 2003
Radiation-sensitive resin composition
JSR CORP35 citations91
US6482568B1Nov 19, 2002
Radiation-sensitive resin composition
JSR CORP28 citations91
US6852791B2Feb 8, 2005
Anti-reflection coating forming composition
JSR CORP17 citations84
US6517992B1Feb 11, 2003
N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same
JSR CORP15 citations83
US6828078B2Dec 7, 2004
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
JSR CORP11 citations74
US6821705B2Nov 23, 2004
Radiation-sensitive resin composition
JSR CORP11 citations73
US7297461B2Nov 20, 2007
Radiation sensitive resin composition
JSR CORP3 citations63
US7108954B2Sep 19, 2006
Radiation-sensitive composition changing in refractive index and method of changing refractive index
JSR CORP4 citations63
US6830868B2Dec 14, 2004
Anthracene derivative and radiation-sensitive resin composition
JSR CORP3 citations63
US8377627B2Feb 19, 2013
Compound and radiation-sensitive composition
JSR CORP2 citations62
US7202016B2Apr 10, 2007
Radiation-sensitive resin composition
JSR CORP4 citations62
US6846895B2Jan 25, 2005
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
JSR CORP3 citations62
US6824954B2Nov 30, 2004
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
JSR CORP4 citations62
US11384172B2Jul 12, 2022
Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method
JSR CORP1 citations51
US6770780B1Aug 3, 2004
Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition
JSR CORP1 citations50
US10415011B2Sep 17, 2019
Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition
JSR CORP0 citations47
US7105269B2Sep 12, 2006
Copolymer, polymer mixture, and radiation-sensitive resin composition
JSR CORP0 citations37
JAPAN SYNTHETIC RUBBER CO LTD
2 patentsUS5110706AMay 5, 1992
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive
JAPAN SYNTHETIC RUBBER CO LTD83 citations96
US5432039AJul 11, 1995
Radiation sensitive quinone diazide and resin composition for microlens
JAPAN SYNTHETIC RUBBER CO LTD24 citations92