Inventor
FUJISAKI KOJI
JP19 patents
⚠️ This page may combine multiple inventors who share the name “FUJISAKI KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
11 patentsUS4758875AJul 19, 1988
Resin encapsulated semiconductor device
HITACHI LTD67 citations95
US4792476ADec 20, 1988
Low thermal expansion resin material and composite shaped article
HITACHI LTD45 citations94
US4690999ASep 1, 1987
Low thermal expansion resin material and composite shaped article
HITACHI LTD45 citations94
US4760126AJul 26, 1988
Fluorine-containing polyamide-acid derivative and polyimide
HITACHI LTD26 citations92
US5208066AMay 4, 1993
Process of forming a patterned polyimide film and articles including such a film
HITACHI LTD29 citations91
US4759958AJul 26, 1988
Method for forming polyimide film by chemical vapor deposition
HITACHI LTD23 citations79
US5133989AJul 28, 1992
Process for producing metal-polyimide composite article
HITACHI LTD12 citations72
US5570506ANov 5, 1996
Method for forming multilayer wiring construction
HITACHI LTD14 citations70
US10737937B2Aug 11, 2020
Sensor characteristic evaluation method and charged particle beam device
HITACHI LTD0 citations52
US5183838AFeb 2, 1993
Acid anhydride complex and process for producing same, and composition containing same
HITACHI LTD0 citations50
US9490328B2Nov 8, 2016
Silicon carbide semiconductor device and manufacturing method of the same
HITACHI LTD0 citations41
HITACHI CHEMICAL CO LTD
8 patentsUS10196542B2Feb 5, 2019
Abrasive, abrasive set, and method for abrading substrate
HITACHI CHEMICAL CO LTD9 citations83
US9932497B2Apr 3, 2018
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD7 citations83
US9346978B2May 24, 2016
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD9 citations83
US9163162B2Oct 20, 2015
Polishing agent, polishing agent set and method for polishing base
HITACHI CHEMICAL CO LTD7 citations83
US9346977B2May 24, 2016
Abrasive, abrasive set, and method for abrading substrate
HITACHI CHEMICAL CO LTD3 citations72
US10557059B2Feb 11, 2020
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD0 citations51
US10557058B2Feb 11, 2020
Polishing agent, polishing agent set, and substrate polishing method
HITACHI CHEMICAL CO LTD0 citations51
US10549399B2Feb 4, 2020
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD0 citations51