Inventor

BANERJEE SHAYAK

US36 patents

⚠️ This page may combine multiple inventors who share the name “BANERJEE SHAYAK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BANERJEE SHAYAK

IBM

Detecting hotspots using machine learning on diffraction patterns

Retargeting multiple patterned integrated circuit device designs

Electrically driven optical proximity correction

Optical rule checking for detecting at risk structures for overlay issues

Optical rule checking for detecting at risk structures for overlay issues

Optical proximity correction (OPC) accounting for critical dimension (CD) variation from inter-level effects

Optical proximity correction (OPC) accounting for critical dimension (CD) variation from inter-level effects

Optical rule checking for detecting at risk structures for overlay issues

Optical rule checking for detecting at risk structures for overlay issues

Optical rule checking for detecting at risk structures for overlay issues

Optical rule checking for detecting at risk structures for overlay issues

AGARWAL KANAK B

Electrically-driven optical proximity correction to compensate for non-optical effects

Method for post decomposition density balancing in integrated circuit layouts, related system and program product

Simultaneous optical proximity correction and decomposition for double exposure lithography

Optical proximity correction for transistors using harmonic mean of gate length

Model-based retargeting of layout patterns for sub-wavelength photolithography

Simultaneous photolithographic mask and target optimization

Frequency domain layout decomposition in double patterning lithography

Solutions for retargeting integrated circuit layouts based on diffraction pattern analysis

Reducing through process delay variation in metal wires

THE JOAN AND IRWIN JACOBS TECHNION-CORNELL INNOVATION INST

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

BANERJEE SHAYAK

Density balancing in multiple patterning lithography using integrated circuit layout fill

Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance

Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance

AGARWAL KANAK BEHARI

Machine learning approach to correct lithographic hot-spots

Pitch-aware multi-patterning lithography

THE JOAN AND IRWIN JACOBS TECHNION CORNELL INNOVATION INST

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

DUMONT EMMANUEL

Sensing device

Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure

YOUV LABS INC

Methods, systems, and devices for calibrating light sensing devices

Methods for guiding personal limit selection in UV dosimetry

GLOBALFOUNDRIES INC

Net-voltage-aware optical proximity correction (OPC)

AGARWAL KANAK

Propagating design tolerances to shape tolerances for lithography