Inventor
LI WENJIE
US121 patents
⚠️ This page may combine multiple inventors who share the name “LI WENJIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LI WENJIE
17 patentsUSD817871SMay 15, 2018
Charger
LI WENJIE14 citations84
USD810012SFeb 13, 2018
Charger
LI WENJIE13 citations84
USD808900SJan 30, 2018
Charger
LI WENJIE9 citations84
USD808899SJan 30, 2018
Charger
LI WENJIE13 citations84
USD1076793SMay 27, 2025
Portable power source
LI WENJIE1 citations75
USD964198SSep 20, 2022
Warning light
LI WENJIE3 citations73
USD956543SJul 5, 2022
Locking connector
LI WENJIE3 citations73
USD859306SSep 10, 2019
Charger
LI WENJIE4 citations73
USD846495SApr 23, 2019
Charger
LI WENJIE3 citations73
USD1112112SFeb 10, 2026
LED module
LI WENJIE0 citations63
USD1110552SJan 27, 2026
LED module
LI WENJIE0 citations63
USD1109378SJan 13, 2026
LED module
LI WENJIE0 citations63
USD1092391SSep 9, 2025
Portable power source
LI WENJIE0 citations63
USD1088314SAug 12, 2025
Flashlight
LI WENJIE0 citations63
US12253245B1Mar 18, 2025
Lighting device with low mispress buttons
LI WENJIE0 citations63
US12158261B1Dec 3, 2024
Connection arrangement for power supply and power wire of split type headlamp
LI WENJIE0 citations63
US11859780B1Jan 2, 2024
Light source switching apparatus for flashlight
LI WENJIE1 citations63
IBM
16 patentsUS6949325B2Sep 27, 2005
Negative resist composition with fluorosulfonamide-containing polymer
IBM91 citations98
US7063931B2Jun 20, 2006
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM27 citations93
US6756180B2Jun 29, 2004
Cyclic olefin-based resist compositions having improved image stability
IBM19 citations93
US6635401B2Oct 21, 2003
Resist compositions with polymers having 2-cyano acrylic monomer
IBM31 citations93
US7335456B2Feb 26, 2008
Top coat material and use thereof in lithography processes
IBM37 citations92
US6534239B2Mar 18, 2003
Resist compositions with polymers having pendant groups containing plural acid labile moieties
IBM21 citations92
US7011923B2Mar 14, 2006
Negative photoresist and method of using thereof
IBM12 citations84
US7563563B2Jul 21, 2009
Wet developable bottom antireflective coating composition and method for use thereof
IBM8 citations82
US7217496B2May 15, 2007
Fluorinated photoresist materials with improved etch resistant properties
IBM15 citations82
US6902874B2Jun 7, 2005
Resist compositions with polymers having 2-cyano acrylic monomer
IBM7 citations74
US6696216B2Feb 24, 2004
Thiophene-containing photo acid generators for photolithography
IBM8 citations74
US7700262B2Apr 20, 2010
Top coat material and use thereof in lithography processes
IBM4 citations63
US7651831B2Jan 26, 2010
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM2 citations63
US7638264B2Dec 29, 2009
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM3 citations63
US7235342B2Jun 26, 2007
Negative photoresist composition including non-crosslinking chemistry
IBM2 citations63
US7081326B2Jul 25, 2006
Negative photoresist and method of using thereof
IBM3 citations63
LUCENT TECHNOLOGIES INC
2 patentsMERCK & CO INC
2 patentsSYSMAX INNOVATIONS CO LTD
2 patentsSHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD
2 patentsUS10503064B2Dec 10, 2019
Method for manufacturing color filter substrate
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD2 citations72
US11271188B2Mar 8, 2022
Display panel and manufacturing method thereof
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD0 citations63
SHENZHEN CHINA STAR OPTOELECT
2 patentsAGERE SYST GUARDIAN CORP
1 patent(unassigned)
1 patentMICELLE PRODUCTS INC
1 patentUNIV PEKING SHENZHEN GRADUATE SCHOOL
1 patentMARVELL ASIA PTE LTD
1 patentSYSWIT OPTOELECTRONICS TECH CO LTD
1 patentNINGBO GEELY AUTOMOBILE RES & DEVELOPMENT CO LTD
1 patentShowing the top 50 of 121 patents by PatentIndex Score.