Inventor
VARANASI PUSHKARA R
US48 patents
⚠️ This page may combine multiple inventors who share the name “VARANASI PUSHKARA R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
25 patentsUS8343706B2Jan 1, 2013
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
IBM6 citations84
US7838198B2Nov 23, 2010
Photoresist compositions and method for multiple exposures with multiple layer resist systems
IBM14 citations84
US7838200B2Nov 23, 2010
Photoresist compositions and method for multiple exposures with multiple layer resist systems
IBM17 citations84
US7011923B2Mar 14, 2006
Negative photoresist and method of using thereof
IBM12 citations84
US8017303B2Sep 13, 2011
Ultra low post exposure bake photoresist materials
IBM7 citations82
US7563563B2Jul 21, 2009
Wet developable bottom antireflective coating composition and method for use thereof
IBM8 citations82
US6372406B1Apr 16, 2002
Deactivated aromatic amines as additives in acid-catalyzed resists
IBM10 citations74
US6140015AOct 31, 2000
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM9 citations73
US8034533B2Oct 11, 2011
Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same
IBM2 citations63
US7803521B2Sep 28, 2010
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems
IBM5 citations63
US7235342B2Jun 26, 2007
Negative photoresist composition including non-crosslinking chemistry
IBM2 citations63
US7081326B2Jul 25, 2006
Negative photoresist and method of using thereof
IBM3 citations63
US8053172B2Nov 8, 2011
Photoresists and methods for optical proximity correction
IBM2 citations61
US7816068B2Oct 19, 2010
Underlayer compositions containing heterocyclic aromatic structures
IBM2 citations61
US7807332B2Oct 5, 2010
Underlayer compositions containing heterocyclic aromatic structures
IBM3 citations61
US7544750B2Jun 9, 2009
Top antireflective coating composition with low refractive index at 193nm radiation wavelength
IBM3 citations61
US7375172B2May 20, 2008
Underlayer compositions containing heterocyclic aromatic structures
IBM2 citations61
US6991890B2Jan 31, 2006
Negative photoresist composition involving non-crosslinking chemistry
IBM6 citations57
US8029975B2Oct 4, 2011
Fused aromatic structures and methods for photolithographic applications
IBM0 citations52
US8021828B2Sep 20, 2011
Photoresist compositions and methods related to near field masks
IBM1 citations52
US7754820B2Jul 13, 2010
Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
IBM0 citations52
US7566527B2Jul 28, 2009
Fused aromatic structures and methods for photolithographic applications
IBM1 citations52
US7435537B2Oct 14, 2008
Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
IBM0 citations52
US6265134B1Jul 24, 2001
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM1 citations52
US7608390B2Oct 27, 2009
Top antireflective coating composition containing hydrophobic and acidic groups
IBM0 citations51
LIU SEN
12 patentsUS8709700B2Apr 29, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN4 citations84
US8663901B2Mar 4, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8658345B2Feb 25, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8628909B2Jan 14, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8628910B2Jan 14, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8623584B2Jan 7, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8617791B2Dec 31, 2013
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN4 citations74
US8518630B2Aug 27, 2013
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN3 citations74
US8906591B2Dec 9, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN0 citations52
US8883395B2Nov 11, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN0 citations52
US8871429B2Oct 28, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN0 citations52
US8741545B2Jun 3, 2014
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
LIU SEN0 citations52