Inventor
WATANABE YUMI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE YUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
11 patentsUS10025162B2Jul 17, 2018
Focus adjustment device for correcting autofocus of focus lens using captured image signal to be recorded, method for controlling the same, and image capture apparatus
CANON KK5 citations84
US9998652B2Jun 12, 2018
Focusing adjustment apparatus and focusing adjustment method
CANON KK9 citations84
US9843710B2Dec 12, 2017
Focusing adjustment apparatus and focusing adjustment method
CANON KK9 citations84
US7986440B2Jul 26, 2011
Image processing apparatus, image forming apparatus, and control method thereof, which form an image by applying N-ary processing
CANON KK11 citations84
US11099459B2Aug 24, 2021
Focus adjustment device and method capable of executing automatic focus detection, and imaging optical system storing information on aberrations thereof
CANON KK3 citations73
US9313469B2Apr 12, 2016
Image capturing apparatus and method of controlling the same
CANON KK4 citations73
US9641741B2May 2, 2017
Focus detection apparatus and method for controlling the same
CANON KK3 citations72
US11822211B2Nov 21, 2023
Imaging optical system storing information on its aberration, imaging apparatus, and control method thereof
CANON KK0 citations62
US8363251B2Jan 29, 2013
Image forming apparatus, print data generation method and computer program for forming an image with halftone processing that uses constraint data
CANON KK3 citations62
US10212334B2Feb 19, 2019
Focusing adjustment apparatus and focusing adjustment method
CANON KK0 citations52
US9742984B2Aug 22, 2017
Image capturing apparatus and method of controlling the same
CANON KK1 citations52
TOSHIBA KK
5 patentsUS6140654AOct 31, 2000
Charged beam lithography apparatus and method thereof
TOSHIBA KK18 citations92
US5994030ANov 30, 1999
Pattern-forming method and lithographic system
TOSHIBA KK23 citations92
US5933211AAug 3, 1999
Charged beam lithography apparatus and method thereof
TOSHIBA KK39 citations92
US6093931AJul 25, 2000
Pattern-forming method and lithographic system
TOSHIBA KK11 citations73
US8014587B2Sep 6, 2011
Pattern test method of testing, in only specific region, defect of pattern on sample formed by charged beam lithography apparatus
TOSHIBA KK0 citations41