Inventor
ORIHARA TOSHIHIKO
JP16 patents
Patents
16 patentsUS10001699B2Jun 19, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP6 citations83
US9195131B2Nov 24, 2015
Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same
HOYA CORP7 citations83
US9897909B2Feb 20, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations72
US9383637B2Jul 5, 2016
Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor device
HOYA CORP3 citations72
US9494851B2Nov 15, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US9348217B2May 24, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US10620527B2Apr 14, 2020
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10429728B2Oct 1, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10295900B2May 21, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10175394B2Jan 8, 2019
Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device
HOYA CORP0 citations51
US10025176B2Jul 17, 2018
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device
HOYA CORP0 citations51
US9798050B2Oct 24, 2017
Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device
HOYA CORP0 citations51
US9581895B2Feb 28, 2017
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device
HOYA CORP0 citations51
US9488904B2Nov 8, 2016
Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same
HOYA CORP0 citations51
US9507254B2Nov 29, 2016
Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device
HOYA CORP0 citations41
US10481488B2Nov 19, 2019
Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method
HOYA CORP0 citations39