Inventor
RANADE RAJIV M
US13 patents
⚠️ This page may combine multiple inventors who share the name “RANADE RAJIV M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
10 patentsUS6284666B1Sep 4, 2001
Method of reducing RIE lag for deep trench silicon etching
IBM87 citations95
US6984529B2Jan 10, 2006
Fabrication process for a magnetic tunnel junction device
IBM106 citations94
US6743727B2Jun 1, 2004
Method of etching high aspect ratio openings
IBM38 citations92
US8367556B1Feb 5, 2013
Use of an organic planarizing mask for cutting a plurality of gate lines
IBM10 citations83
US6709917B2Mar 23, 2004
Method to increase the etch rate and depth in high aspect ratio structure
IBM8 citations73
US7144769B2Dec 5, 2006
Method to achieve increased trench depth, independent of CD as defined by lithography
IBM4 citations62
US7091081B2Aug 15, 2006
Method for patterning a semiconductor region
IBM3 citations56
US7291285B2Nov 6, 2007
Method and system for line-dimension control of an etch process
IBM4 citations54
US6821864B2Nov 23, 2004
Method to achieve increased trench depth, independent of CD as defined by lithography
IBM1 citations51
US7700378B2Apr 20, 2010
Method and system for line-dimension control of an etch process
IBM0 citations44