Inventor
LAZARUS RICHARD M
US16 patents
⚠️ This page may combine multiple inventors who share the name “LAZARUS RICHARD M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MORTON INT INC
10 patentsUS5225312AJul 6, 1993
Positive photoresist containing dyes
MORTON INT INC24 citations88
US5314782AMay 24, 1994
Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
MORTON INT INC18 citations73
US5208138AMay 4, 1993
High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content
MORTON INT INC7 citations71
US5182184AJan 26, 1993
Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
MORTON INT INC7 citations71
US5342734AAug 30, 1994
Deep UV sensitive photoresist resistant to latent image decay
MORTON INT INC10 citations70
US5094934AMar 10, 1992
Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
MORTON INT INC13 citations69
US4996122AFeb 26, 1991
Method of forming resist pattern and thermally stable and highly resolved resist pattern
MORTON INT INC3 citations62
US5130409AJul 14, 1992
Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists
MORTON INT INC3 citations60
US5126230AJun 30, 1992
High contrast, positive photoresist developer containing alkanolamine
MORTON INT INC2 citations58
US4997734AMar 5, 1991
Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate
MORTON INT INC2 citations56
THIOKOL MORTON INC
3 patentsUS4943511AJul 24, 1990
High sensitivity mid and deep UV resist
THIOKOL MORTON INC34 citations92
US4920028AApr 24, 1990
High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
THIOKOL MORTON INC22 citations80
US4808513AFeb 28, 1989
Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
THIOKOL MORTON INC22 citations78