Inventor
HAN DONGSEOK
KR5 patents
Patents
5 patentsUS10818503B2Oct 27, 2020
Method of etching at low temperature and plasma etching apparatus
SAMSUNG ELECTRONICS CO LTD2 citations63
US12476089B2Nov 18, 2025
Plasma processing apparatus
SAMSUNG ELECTRONICS CO LTD0 citations55
US12222362B2Feb 11, 2025
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
SAMSUNG ELECTRONICS CO LTD0 citations45
US12546393B2Feb 10, 2026
Substrate processing apparatus
SAMSUNG ELECTRONICS CO LTD0 citations43
US12183555B2Dec 31, 2024
Substrate processing apparatus and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations43