Inventor
TOMOYASU MASAYUKI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “TOMOYASU MASAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
17 patentsUS5900103AMay 4, 1999
Plasma treatment method and apparatus
TOKYO ELECTRON LTD173 citations99
US5888907AMar 30, 1999
Plasma processing method
TOKYO ELECTRON LTD427 citations99
US6544380B2Apr 8, 2003
Plasma treatment method and apparatus
TOKYO ELECTRON LTD104 citations98
US6074518AJun 13, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD276 citations98
US6423242B1Jul 23, 2002
Etching method
TOKYO ELECTRON LTD58 citations96
US6106737AAug 22, 2000
Plasma treatment method utilizing an amplitude-modulated high frequency power
TOKYO ELECTRON LTD66 citations96
US5904780AMay 18, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD73 citations96
US7477960B2Jan 13, 2009
Fault detection and classification (FDC) using a run-to-run controller
TOKYO ELECTRON LTD86 citations95
US5343047AAug 30, 1994
Ion implantation system
TOKYO ELECTRON LTD62 citations95
US7505879B2Mar 17, 2009
Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
TOKYO ELECTRON LTD56 citations92
US7047095B2May 16, 2006
Process control system and process control method
TOKYO ELECTRON LTD22 citations92
US5067798ANov 26, 1991
Laser beam scanning system
TOKYO ELECTRON LTD24 citations92
US7648610B2Jan 19, 2010
Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
TOKYO ELECTRON LTD42 citations91
US7153387B1Dec 26, 2006
Plasma processing apparatus and method of plasma processing
TOKYO ELECTRON LTD19 citations84
US7877161B2Jan 25, 2011
Method and system for performing a chemical oxide removal process
TOKYO ELECTRON LTD13 citations80
US7289866B2Oct 30, 2007
Plasma processing method and apparatus
TOKYO ELECTRON LTD2 citations63
US7172675B2Feb 6, 2007
Observation window of plasma processing apparatus and plasma processing apparatus using the same
TOKYO ELECTRON LTD0 citations42
SAMSUNG ELECTRONICS CO LTD
6 patentsUS11837496B2Dec 5, 2023
Substrate processing apparatus and method of processing a substrate
SAMSUNG ELECTRONICS CO LTD0 citations60
US11018046B2May 25, 2021
Substrate processing apparatus including edge ring
SAMSUNG ELECTRONICS CO LTD1 citations60
US11817298B2Nov 14, 2023
Focus ring, chuck assembly for securing a substrate and plasma treatment apparatus having the same
SAMSUNG ELECTRONICS CO LTD0 citations57
US11450545B2Sep 20, 2022
Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations47
US9799561B2Oct 24, 2017
Method for fabricating a semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations41
US9859175B2Jan 2, 2018
Substrate processing system, method of managing the same and method of manufacturing semiconductor device with the same
SAMSUNG ELECTRONICS CO LTD0 citations39