Inventor

MCFEELY FENTON R

US38 patents

⚠️ This page may combine multiple inventors who share the name “MCFEELY FENTON R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MCFEELY FENTON R

IBM

Removal of charged defects from metal oxide-gate stacks

Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures

Method for increasing deposition rates of metal layers from metal-carbonyl precursors

Method for increasing the capacitance of a trench capacitor

Method of forming a tantalum-containing gate electrode structure

Low-pressure deposition of metal layers from metal-carbonyl precursors

Method of forming a metal layer using an intermittent precursor gas flow process

Ultra thin, single phase, diffusion barrier for metal conductors

Method of forming metal/high-k gate stacks with high mobility

Selective, low-temperature chemical vapor deposition of gold

Noble metal cap for interconnect structures

Method of depositing metal layers from metal-carbonyl precursors

Method for protecting refractory metal thin film requiring high temperature processing in an oxidizing atmosphere and structure formed thereby

Process for passivating the semiconductor-dielectric interface of a MOS device and MOS device formed thereby

MOS device having a passivated semiconductor-dielectric interface

Structure and process for metallization in high aspect ratio features

Structure to facilitate plating into high aspect ratio vias

Method for improving the selectivity of a CVD process

TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks

Method for manufacturing device substrate with metal back-gate and structure formed thereby

Method for manufacturing device substrate with metal back-gate and structure formed thereby

Method for forming a passivated metal layer

Process for chemical vapor deposition of materials with via filling capability and structure formed thereby

Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures

Method of forming HfSiN metal for n-FET applications

Dispenser system for atomic beam assisted metal organic chemical vapor deposition (MOCVD)

Structure having refractory metal film on a substrate

High temperature processing compatible metal gate electrode for pFETS and methods for fabrication

YANG CHIH-CHAO

Structure and process for metallization in high aspect ratio features

Structure and process for metallization in high aspect ratio features

Noble metal cap for interconnect structures

TOKYO ELECTRON LTD

Method and system for refurbishing a metal carbonyl precursor

Method for increasing deposition rates of metal layers from metal-carbonyl precursors

Method for processing a substrate

HANNON JAMES B

Activation of graphene buffer layers on silicon carbide by ultra low temperature oxidation

GLOBALFOUNDRIES INC

Method and structure to improve the conductivity of narrow copper filled vias

ANDREONI WANDA

Method of forming metal/high-κ gate stacks with high mobility

GARDNER JENNIFER L

Chemical vapor deposition method for the incorporation of nitrogen into materials including germanium and antimony