Inventor
DUBOIS GERAUD JEAN-MICHEL
US23 patents
⚠️ This page may combine multiple inventors who share the name “DUBOIS GERAUD JEAN-MICHEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
12 patentsUS7468330B2Dec 23, 2008
Imprint process using polyhedral oligomeric silsesquioxane based imprint materials
IBM23 citations92
US7919225B2Apr 5, 2011
Photopatternable dielectric materials for BEOL applications and methods for use
IBM15 citations84
US7459183B2Dec 2, 2008
Method of forming low-K interlevel dielectric layers and structures
IBM7 citations74
US9058983B2Jun 16, 2015
In-situ hardmask generation
IBM6 citations72
US8026293B2Sep 27, 2011
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials
IBM4 citations63
US11371143B2Jun 28, 2022
Implementing the post-porosity plasma protection (P4) process using I-CVD
IBM0 citations62
US7960442B2Jun 14, 2011
Nanoporous media templated from unsymmetrical amphiphilic porogens
IBM0 citations52
US7931829B2Apr 26, 2011
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
IBM0 citations52
US7927664B2Apr 19, 2011
Method of step-and-flash imprint lithography
IBM0 citations52
US7820242B2Oct 26, 2010
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
IBM0 citations52
US7482389B2Jan 27, 2009
Nanoporous media with lamellar structures
IBM0 citations52
US8871632B2Oct 28, 2014
Reduction of pore fill material dewetting
IBM0 citations51
DUBOIS GERAUD JEAN-MICHEL
3 patentsUS8828489B2Sep 9, 2014
Homogeneous modification of porous films
DUBOIS GERAUD JEAN-MICHEL11 citations82
US8541301B2Sep 24, 2013
Reduction of pore fill material dewetting
DUBOIS GERAUD JEAN-MICHEL5 citations82
US8268903B2Sep 18, 2012
Nanoporous media templated from unsymmetrical amphiphilic porogens
DUBOIS GERAUD JEAN-MICHEL0 citations51