Inventor
AOTANI YOSHIMASA
US24 patents
Patents
24 patentsUS4555474ANov 26, 1985
Photopolymerizable composition
FUJI PHOTO FILM CO LTD67 citations96
US4505793AMar 19, 1985
Photopolymerizable compositions
FUJI PHOTO FILM CO LTD73 citations96
US4359524ANov 16, 1982
Heat developable photosensitive material
FUJI PHOTO FILM CO LTD68 citations96
US4139391AFeb 13, 1979
Light-sensitive resin composition and metal image-forming material using the same
FUJI PHOTO FILM CO LTD57 citations96
US5939235AAug 17, 1999
Positive-working light-sensitive composition
FUJI PHOTO FILM CO LTD49 citations92
US5364738ANov 15, 1994
Light-sensitive composition
FUJI PHOTO FILM CO LTD35 citations92
US4772534ASep 20, 1988
Light sensitive composition containing a light sensitive s-triazine compound
FUJI PHOTO FILM CO LTD31 citations92
US4483918ANov 20, 1984
Color photographic light-sensitive material
FUJI PHOTO FILM CO LTD28 citations92
US4904563AFeb 27, 1990
Microcapsules and light-sensitive recording material using the same
FUJI PHOTO FILM CO LTD20 citations82
US4271251AJun 2, 1981
Photosensitive compositions
FUJI PHOTO FILM CO LTD20 citations82
US4837128AJun 6, 1989
Light-sensitive composition
FUJI PHOTO FILM CO LTD21 citations79
US5721288AFeb 24, 1998
Photopolymerizable composition including a photopolymerization initiation system having excellent light sensitivity to visible light
FUJI PHOTO FILM CO LTD14 citations74
US5250385AOct 5, 1993
Photopolymerizable composition
FUJI PHOTO FILM CO LTD14 citations74
US5202216AApr 13, 1993
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD10 citations74
US4876173AOct 24, 1989
Photopolymerizable composition on polyethylene terephthalate film support
FUJI PHOTO FILM CO LTD9 citations74
US4636459AJan 13, 1987
Photopolymerizable compositions
FUJI PHOTO FILM CO LTD18 citations74
US4642283AFeb 10, 1987
Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution
FUJI PHOTO FILM CO LTD7 citations73
US5358824AOct 25, 1994
Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring
FUJI PHOTO FILM CO LTD9 citations72
US4842986AJun 27, 1989
Positively working resist material
FUJI PHOTO FILM CO LTD7 citations72
US4497888AFeb 5, 1985
Light-sensitive o-quinonediazide printing plate with oxonol dye
FUJI PHOTO FILM CO LTD18 citations72
US4356247AOct 26, 1982
Light-sensitive compositions
FUJI PHOTO FILM CO LTD17 citations70
US5370965ADec 6, 1994
Positive-working light-sensitive composition containing diazonium salt and novolak resin
FUJI PHOTO FILM CO LTD3 citations62
US4902602AFeb 20, 1990
Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group
FUJI PHOTO FILM CO LTD3 citations61
US4542085ASep 17, 1985
Negative working diazo light-sensitive composition with oxonol dye and lithographic printing plate using the same
FUJI PHOTO FILM CO LTD6 citations61