Inventor
CHU WEN-TING
TW249 patents
⚠️ This page may combine multiple inventors who share the name “CHU WEN-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
24 patentsUS10164182B1Dec 25, 2018
Switching layer scheme to enhance RRAM performance
TAIWAN SEMICONDUCTOR MFG CO LTD36 citations98
US9601545B1Mar 21, 2017
Series MIM structures compatible with RRAM process
TAIWAN SEMICONDUCTOR MFG CO LTD61 citations98
US9461245B1Oct 4, 2016
Bottom electrode for RRAM structure
TAIWAN SEMICONDUCTOR MFG CO LTD55 citations98
US9172036B2Oct 27, 2015
Top electrode blocking layer for RRAM device
TAIWAN SEMICONDUCTOR MFG CO LTD29 citations98
US10930333B2Feb 23, 2021
Embedded ferroelectric memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD20 citations94
US10008662B2Jun 26, 2018
Perpendicular magnetic tunneling junction (MTJ) for improved magnetoresistive random-access memory (MRAM) process
TAIWAN SEMICONDUCTOR MFG CO LTD53 citations94
US9847481B2Dec 19, 2017
Metal landing on top electrode of RRAM
TAIWAN SEMICONDUCTOR MFG CO LTD24 citations94
US9792987B1Oct 17, 2017
Resistive random access memory device
TAIWAN SEMICONDUCTOR MFG CO LTD35 citations94
US9577009B1Feb 21, 2017
RRAM cell with PMOS access transistor
TAIWAN SEMICONDUCTOR MFG CO LTD29 citations94
US9553265B1Jan 24, 2017
RRAM device with data storage layer having increased height
TAIWAN SEMICONDUCTOR MFG CO LTD33 citations94
US9543511B2Jan 10, 2017
RRAM device
TAIWAN SEMICONDUCTOR MFG CO LTD22 citations94
US9431604B2Aug 30, 2016
Resistive random access memory (RRAM) and method of making
TAIWAN SEMICONDUCTOR MFG CO LTD29 citations94
US9425392B2Aug 23, 2016
RRAM cell structure with laterally offset BEVA/TEVA
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations93
US9178144B1Nov 3, 2015
RRAM cell with bottom electrode
TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
US11437084B2Sep 6, 2022
Embedded ferroelectric memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US11362271B2Jun 14, 2022
Switching layer scheme to enhance RRAM performance
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations84
US11296147B2Apr 5, 2022
Method for manufacturing memory device having spacer
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US11276819B2Mar 15, 2022
Metal landing on top electrode of RRAM
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US11024381B2Jun 1, 2021
Resistive random access memory device
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10811600B2Oct 20, 2020
Switching layer scheme to enhance RRAM performance
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10762960B2Sep 1, 2020
Resistive random access memory device
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10516106B2Dec 24, 2019
Electrode structure to improve RRAM performance
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10505107B2Dec 10, 2019
Switching layer scheme to enhance RRAM performance
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10504963B2Dec 10, 2019
RRAM memory cell with multiple filaments
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
TAIWAN SEMICONDUCTOR MFG
24 patentsUS8669607B1Mar 11, 2014
Methods and apparatus for non-volatile memory cells with increased programming efficiency
TAIWAN SEMICONDUCTOR MFG96 citations97
US6124177ASep 26, 2000
Method for making deep sub-micron mosfet structures having improved electrical characteristics
TAIWAN SEMICONDUCTOR MFG74 citations96
US6204126B1Mar 20, 2001
Method to fabricate a new structure with multi-self-aligned for split-gate flash
TAIWAN SEMICONDUCTOR MFG56 citations95
US8963114B2Feb 24, 2015
One transistor and one resistive (1T1R) random access memory (RRAM) structure with dual spacers
TAIWAN SEMICONDUCTOR MFG32 citations94
US9231197B2Jan 5, 2016
Logic compatible RRAM structure and process
TAIWAN SEMICONDUCTOR MFG23 citations93
US9099647B2Aug 4, 2015
One transistor and one resistive (1T1R) random access memory (RAM) structure with dual spacers
TAIWAN SEMICONDUCTOR MFG16 citations93
US9023699B2May 5, 2015
Resistive random access memory (RRAM) structure and method of making the RRAM structure
TAIWAN SEMICONDUCTOR MFG21 citations93
US6348382B1Feb 19, 2002
Integration process to increase high voltage breakdown performance
TAIWAN SEMICONDUCTOR MFG29 citations93
US6297098B1Oct 2, 2001
Tilt-angle ion implant to improve junction breakdown in flash memory application
TAIWAN SEMICONDUCTOR MFG38 citations93
US6251744B1Jun 26, 2001
Implant method to improve characteristics of high voltage isolation and high voltage breakdown
TAIWAN SEMICONDUCTOR MFG32 citations93
US6130168AOct 10, 2000
Using ONO as hard mask to reduce STI oxide loss on low voltage device in flash or EPROM process
TAIWAN SEMICONDUCTOR MFG47 citations93
US6127229AOct 3, 2000
Process of forming an EEPROM device having a split gate
TAIWAN SEMICONDUCTOR MFG36 citations93
US6001687ADec 14, 1999
Process for forming self-aligned source in flash cell using SiN spacer as hard mask
TAIWAN SEMICONDUCTOR MFG31 citations93
US6787418B2Sep 7, 2004
Method of making the selection gate in a split-gate flash eeprom cell and its structure
TAIWAN SEMICONDUCTOR MFG16 citations92
US6538277B2Mar 25, 2003
Split-gate flash cell
TAIWAN SEMICONDUCTOR MFG23 citations92
US6403494B1Jun 11, 2002
Method of forming a floating gate self-aligned to STI on EEPROM
TAIWAN SEMICONDUCTOR MFG55 citations92
US6312989B1Nov 6, 2001
Structure with protruding source in split-gate flash
TAIWAN SEMICONDUCTOR MFG43 citations92
US6309928B1Oct 30, 2001
Split-gate flash cell
TAIWAN SEMICONDUCTOR MFG25 citations92
US6297099B1Oct 2, 2001
Method to free control tunneling oxide thickness on poly tip of flash
TAIWAN SEMICONDUCTOR MFG24 citations92
US6110782AAug 29, 2000
Method to combine high voltage device and salicide process
TAIWAN SEMICONDUCTOR MFG32 citations92
US6465836B2Oct 15, 2002
Vertical split gate field effect transistor (FET) device
TAIWAN SEMICONDUCTOR MFG40 citations91
US6468863B2Oct 22, 2002
Split gate field effect transistor (FET) device employing dielectric barrier layer and method for fabrication thereof
TAIWAN SEMICONDUCTOR MFG31 citations90
US6110780AAug 29, 2000
Using NO or N2 O treatment to generate different oxide thicknesses in one oxidation step for single poly non-volatile memory
TAIWAN SEMICONDUCTOR MFG31 citations90
US6261905B1Jul 17, 2001
Flash memory structure with stacking gate formed using damascene-like structure
TAIWAN SEMICONDUCTOR MFG26 citations89
TU KUO-CHI
1 patentMOSEL VITELIC INC
1 patentShowing the top 50 of 249 patents by PatentIndex Score.