P

Inventor

CHU WEN-TING

TW249 patents
⚠️ This page may combine multiple inventors who share the name “CHU WEN-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

24 patents
US10164182B1Dec 25, 2018

Switching layer scheme to enhance RRAM performance

TAIWAN SEMICONDUCTOR MFG CO LTD36 citations98
US9601545B1Mar 21, 2017

Series MIM structures compatible with RRAM process

TAIWAN SEMICONDUCTOR MFG CO LTD61 citations98
US9461245B1Oct 4, 2016

Bottom electrode for RRAM structure

TAIWAN SEMICONDUCTOR MFG CO LTD55 citations98
US9172036B2Oct 27, 2015

Top electrode blocking layer for RRAM device

TAIWAN SEMICONDUCTOR MFG CO LTD29 citations98
US10930333B2Feb 23, 2021

Embedded ferroelectric memory cell

TAIWAN SEMICONDUCTOR MFG CO LTD20 citations94
US10008662B2Jun 26, 2018

Perpendicular magnetic tunneling junction (MTJ) for improved magnetoresistive random-access memory (MRAM) process

TAIWAN SEMICONDUCTOR MFG CO LTD53 citations94
US9847481B2Dec 19, 2017

Metal landing on top electrode of RRAM

TAIWAN SEMICONDUCTOR MFG CO LTD24 citations94
US9792987B1Oct 17, 2017

Resistive random access memory device

TAIWAN SEMICONDUCTOR MFG CO LTD35 citations94
US9577009B1Feb 21, 2017

RRAM cell with PMOS access transistor

TAIWAN SEMICONDUCTOR MFG CO LTD29 citations94
US9553265B1Jan 24, 2017

RRAM device with data storage layer having increased height

TAIWAN SEMICONDUCTOR MFG CO LTD33 citations94
US9543511B2Jan 10, 2017

RRAM device

TAIWAN SEMICONDUCTOR MFG CO LTD22 citations94
US9431604B2Aug 30, 2016

Resistive random access memory (RRAM) and method of making

TAIWAN SEMICONDUCTOR MFG CO LTD29 citations94
US9425392B2Aug 23, 2016

RRAM cell structure with laterally offset BEVA/TEVA

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations93
US9178144B1Nov 3, 2015

RRAM cell with bottom electrode

TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
US11437084B2Sep 6, 2022

Embedded ferroelectric memory cell

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US11362271B2Jun 14, 2022

Switching layer scheme to enhance RRAM performance

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations84
US11296147B2Apr 5, 2022

Method for manufacturing memory device having spacer

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US11276819B2Mar 15, 2022

Metal landing on top electrode of RRAM

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US11024381B2Jun 1, 2021

Resistive random access memory device

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10811600B2Oct 20, 2020

Switching layer scheme to enhance RRAM performance

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10762960B2Sep 1, 2020

Resistive random access memory device

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10516106B2Dec 24, 2019

Electrode structure to improve RRAM performance

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10505107B2Dec 10, 2019

Switching layer scheme to enhance RRAM performance

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10504963B2Dec 10, 2019

RRAM memory cell with multiple filaments

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84

TAIWAN SEMICONDUCTOR MFG

24 patents
US8669607B1Mar 11, 2014

Methods and apparatus for non-volatile memory cells with increased programming efficiency

TAIWAN SEMICONDUCTOR MFG96 citations97
US6124177ASep 26, 2000

Method for making deep sub-micron mosfet structures having improved electrical characteristics

TAIWAN SEMICONDUCTOR MFG74 citations96
US6204126B1Mar 20, 2001

Method to fabricate a new structure with multi-self-aligned for split-gate flash

TAIWAN SEMICONDUCTOR MFG56 citations95
US8963114B2Feb 24, 2015

One transistor and one resistive (1T1R) random access memory (RRAM) structure with dual spacers

TAIWAN SEMICONDUCTOR MFG32 citations94
US9231197B2Jan 5, 2016

Logic compatible RRAM structure and process

TAIWAN SEMICONDUCTOR MFG23 citations93
US9099647B2Aug 4, 2015

One transistor and one resistive (1T1R) random access memory (RAM) structure with dual spacers

TAIWAN SEMICONDUCTOR MFG16 citations93
US9023699B2May 5, 2015

Resistive random access memory (RRAM) structure and method of making the RRAM structure

TAIWAN SEMICONDUCTOR MFG21 citations93
US6348382B1Feb 19, 2002

Integration process to increase high voltage breakdown performance

TAIWAN SEMICONDUCTOR MFG29 citations93
US6297098B1Oct 2, 2001

Tilt-angle ion implant to improve junction breakdown in flash memory application

TAIWAN SEMICONDUCTOR MFG38 citations93
US6251744B1Jun 26, 2001

Implant method to improve characteristics of high voltage isolation and high voltage breakdown

TAIWAN SEMICONDUCTOR MFG32 citations93
US6130168AOct 10, 2000

Using ONO as hard mask to reduce STI oxide loss on low voltage device in flash or EPROM process

TAIWAN SEMICONDUCTOR MFG47 citations93
US6127229AOct 3, 2000

Process of forming an EEPROM device having a split gate

TAIWAN SEMICONDUCTOR MFG36 citations93
US6001687ADec 14, 1999

Process for forming self-aligned source in flash cell using SiN spacer as hard mask

TAIWAN SEMICONDUCTOR MFG31 citations93
US6787418B2Sep 7, 2004

Method of making the selection gate in a split-gate flash eeprom cell and its structure

TAIWAN SEMICONDUCTOR MFG16 citations92
US6538277B2Mar 25, 2003

Split-gate flash cell

TAIWAN SEMICONDUCTOR MFG23 citations92
US6403494B1Jun 11, 2002

Method of forming a floating gate self-aligned to STI on EEPROM

TAIWAN SEMICONDUCTOR MFG55 citations92
US6312989B1Nov 6, 2001

Structure with protruding source in split-gate flash

TAIWAN SEMICONDUCTOR MFG43 citations92
US6309928B1Oct 30, 2001

Split-gate flash cell

TAIWAN SEMICONDUCTOR MFG25 citations92
US6297099B1Oct 2, 2001

Method to free control tunneling oxide thickness on poly tip of flash

TAIWAN SEMICONDUCTOR MFG24 citations92
US6110782AAug 29, 2000

Method to combine high voltage device and salicide process

TAIWAN SEMICONDUCTOR MFG32 citations92
US6465836B2Oct 15, 2002

Vertical split gate field effect transistor (FET) device

TAIWAN SEMICONDUCTOR MFG40 citations91
US6468863B2Oct 22, 2002

Split gate field effect transistor (FET) device employing dielectric barrier layer and method for fabrication thereof

TAIWAN SEMICONDUCTOR MFG31 citations90
US6110780AAug 29, 2000

Using NO or N2 O treatment to generate different oxide thicknesses in one oxidation step for single poly non-volatile memory

TAIWAN SEMICONDUCTOR MFG31 citations90
US6261905B1Jul 17, 2001

Flash memory structure with stacking gate formed using damascene-like structure

TAIWAN SEMICONDUCTOR MFG26 citations89

TU KUO-CHI

1 patent

MOSEL VITELIC INC

1 patent

Showing the top 50 of 249 patents by PatentIndex Score.