Inventor
SAWACHI ATSUSHI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “SAWACHI ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS12040166B2Jul 16, 2024
Substrate processing apparatus, substrate processing system, and maintenance method
TOKYO ELECTRON LTD3 citations72
US11217432B2Jan 4, 2022
Gas supply system, plasma processing apparatus, and control method for gas supply system
TOKYO ELECTRON LTD2 citations72
US10229844B2Mar 12, 2019
Gas supply system, gas supply control method and gas replacement method
TOKYO ELECTRON LTD3 citations71
US10472717B2Nov 12, 2019
Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatus
TOKYO ELECTRON LTD6 citations68
US12347660B2Jul 1, 2025
Substrate processing apparatus, substrate processing system, and maintenance method
TOKYO ELECTRON LTD1 citations62
US12033834B2Jul 9, 2024
Flow rate controller, gas supply system, and flow rate control method
TOKYO ELECTRON LTD0 citations62
US11698648B2Jul 11, 2023
Gas supply system and gas supply method
TOKYO ELECTRON LTD0 citations62
US11694878B2Jul 4, 2023
Gas supply system, plasma processing apparatus, and control method for gas supply system
TOKYO ELECTRON LTD0 citations62
US11538665B2Dec 27, 2022
Gas supply system, substrate processing apparatus, and control method for gas supply system
TOKYO ELECTRON LTD1 citations62
US10996688B2May 4, 2021
Gas supply system and gas supply method
TOKYO ELECTRON LTD0 citations62
US10607819B2Mar 31, 2020
Cleaning method and processing apparatus
TOKYO ELECTRON LTD1 citations62
US10533916B2Jan 14, 2020
Method for inspecting for leaks in gas supply system valves
TOKYO ELECTRON LTD1 citations62
US10665430B2May 26, 2020
Gas supply system, substrate processing system and gas supply method
TOKYO ELECTRON LTD1 citations60
US12377503B2Aug 5, 2025
Part replacement system and part replacement device
TOKYO ELECTRON LTD0 citations59
US12002666B2Jun 4, 2024
Measuring device, measuring method, and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations59
US11992912B2May 28, 2024
Part replacement system and part replacement device
TOKYO ELECTRON LTD0 citations59
US12170187B2Dec 17, 2024
Gas supply system, plasma processing apparatus, and gas supply method
TOKYO ELECTRON LTD0 citations51
US12046454B2Jul 23, 2024
Performance calculation method and processing apparatus
TOKYO ELECTRON LTD0 citations51
US11513541B2Nov 29, 2022
Method of inspecting and inspection apparatus
TOKYO ELECTRON LTD0 citations51
US12525466B2Jan 13, 2026
Processing apparatus and processing method
TOKYO ELECTRON LTD0 citations50
US12424423B2Sep 23, 2025
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US12494383B2Dec 9, 2025
Gas supply device and semiconductor manufacturing apparatus
TOKYO ELECTRON LTD0 citations48
US10665431B2May 26, 2020
Processing method
TOKYO ELECTRON LTD0 citations40
US9904299B2Feb 27, 2018
Gas supply control method
TOKYO ELECTRON LTD0 citations39