Inventor

SRINIVASAN SWAMINATHAN T

US21 patents

⚠️ This page may combine multiple inventors who share the name “SRINIVASAN SWAMINATHAN T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SRINIVASAN SWAMINATHAN T

APPLIED MATERIALS INC

Bottom processing

High-density substrate processing systems and methods

Bottom processing

Apparatus for impurity layered epitaxy

Multizone control of lamps in a conical lamphead using pyrometers

Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films

Multizone control of lamps in a conical lamphead using pyrometers

Utilization of angled trench for effective aspect ratio trapping of defects in strain relaxed heteroepitaxy of semiconductor films

Multizone control of lamps in a conical lamphead using pyrometers

High-density substrate processing systems and methods

Chamber architecture for epitaxial deposition and advanced epitaxial film applications

Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet

Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materials

Accelerated relaxation of strain-relaxed epitaxial buffers by use of integrated or stand-alone thermal processing

Conditioning of a processing chamber

Heater pedestal assembly for wide range temperature control

Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films

Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices

Gas injector for epitaxy and CVD chamber

RANISH JOSEPH M

Multizone control of lamps in a conical lamphead using pyrometers

Process chamber having separate process gas and purge gas regions