Inventor
LEE MYUNGJUN
KR32 patents
⚠️ This page may combine multiple inventors who share the name “LEE MYUNGJUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
20 patentsUS12347096B2Jul 1, 2025
Semiconductor measurement apparatus
SAMSUNG ELECTRONICS CO LTD2 citations73
US12002698B2Jun 4, 2024
Metrology apparatus and method based on diffraction using oblique illumination and method of manufacturing semiconductor device using the metrology method
SAMSUNG ELECTRONICS CO LTD4 citations71
US11972960B2Apr 30, 2024
Imaging ellipsometry (IE)-based inspection method and method of fabricating semiconductor device by using IE-based inspection method
SAMSUNG ELECTRONICS CO LTD3 citations70
US11726046B2Aug 15, 2023
Multi-scale spectral imaging apparatuses and methods, and methods of manufacturing semiconductor devices by using the imaging methods
SAMSUNG ELECTRONICS CO LTD4 citations70
US12578178B2Mar 17, 2026
Pupil image measuring device and method
SAMSUNG ELECTRONICS CO LTD0 citations61
US12228499B2Feb 18, 2025
Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method
SAMSUNG ELECTRONICS CO LTD0 citations60
US12045009B2Jul 23, 2024
Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM
SAMSUNG ELECTRONICS CO LTD0 citations60
US11604136B2Mar 14, 2023
Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method
SAMSUNG ELECTRONICS CO LTD0 citations60
US11314205B2Apr 26, 2022
Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM
SAMSUNG ELECTRONICS CO LTD0 citations60
US11988495B2May 21, 2024
Through-focus image-based metrology device, operation method thereof, and computing device for executing the operation
SAMSUNG ELECTRONICS CO LTD1 citations56
US12535433B2Jan 27, 2026
Focus control method for spectroscopic measuring apparatus, inspection method for semiconductor device, and spectroscopic measuring apparatus for performing the same
SAMSUNG ELECTRONICS CO LTD0 citations55
US12566144B2Mar 3, 2026
Semiconductor inspection apparatus
SAMSUNG ELECTRONICS CO LTD0 citations49
US11428947B2Aug 30, 2022
Super-resolution holographic microscope
SAMSUNG ELECTRONICS CO LTD0 citations49
US11275034B2Mar 15, 2022
Inspection apparatus and method based on coherent diffraction imaging (CDI)
SAMSUNG ELECTRONICS CO LTD0 citations49
US12405226B2Sep 2, 2025
Substrate inspection apparatus and substrate inspection method
SAMSUNG ELECTRONICS CO LTD0 citations47
US12222282B2Feb 11, 2025
Semiconductor measurement apparatus
SAMSUNG ELECTRONICS CO LTD0 citations47
US12038718B2Jul 16, 2024
Holographic microscope and manufacturing method of semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations46
US12560529B2Feb 24, 2026
Imaging ellipsometer and method of measuring an overlay error using the same
SAMSUNG ELECTRONICS CO LTD0 citations43
US12561788B2Feb 24, 2026
Fluorescence microscopy metrology system and method of operating fluorescence microscopy metrology system
SAMSUNG ELECTRONICS CO LTD0 citations41
US12307650B2May 20, 2025
Scanning electron microscope device, semiconductor manufacturing device, and method of controlling semiconductor manufacturing device
SAMSUNG ELECTRONICS CO LTD0 citations40
KLA TENCOR CORP
6 patentsUS10095122B1Oct 9, 2018
Systems and methods for fabricating metrology targets with sub-resolution features
KLA TENCOR CORP18 citations86
US10685165B2Jun 16, 2020
Metrology using overlay and yield critical patterns
KLA TENCOR CORP2 citations73
US10018919B2Jul 10, 2018
System and method for fabricating metrology targets oriented with an angle rotated with respect to device features
KLA TENCOR CORP4 citations73
US10579768B2Mar 3, 2020
Process compatibility improvement by fill factor modulation
KLA TENCOR CORP3 citations72
US10216096B2Feb 26, 2019
Process-sensitive metrology systems and methods
KLA TENCOR CORP2 citations71
US10209627B2Feb 19, 2019
Systems and methods for focus-sensitive metrology targets
KLA TENCOR CORP2 citations70