Inventor
HEMKER DAVID
US23 patents
⚠️ This page may combine multiple inventors who share the name “HEMKER DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
20 patentsUS6527911B1Mar 4, 2003
Configurable plasma volume etch chamber
LAM RES CORP218 citations99
US7367345B1May 6, 2008
Apparatus and method for providing a confined liquid for immersion lithography
LAM RES CORP62 citations98
US6528427B2Mar 4, 2003
Methods for reducing contamination of semiconductor substrates
LAM RES CORP69 citations95
US7010468B2Mar 7, 2006
Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection
LAM RES CORP16 citations92
US6929531B2Aug 16, 2005
System and method for metal residue detection and mapping within a multi-step sequence
LAM RES CORP23 citations92
US6808590B1Oct 26, 2004
Method and apparatus of arrayed sensors for metrological control
LAM RES CORP31 citations92
US6759336B1Jul 6, 2004
Methods for reducing contamination of semiconductor substrates
LAM RES CORP21 citations92
US6716303B1Apr 6, 2004
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
LAM RES CORP20 citations92
US7749689B2Jul 6, 2010
Methods for providing a confined liquid for immersion lithography
LAM RES CORP13 citations84
US7521358B2Apr 21, 2009
Process integration scheme to lower overall dielectric constant in BEoL interconnect structures
LAM RES CORP11 citations84
US7309618B2Dec 18, 2007
Method and apparatus for real time metal film thickness measurement
LAM RES CORP10 citations84
US6939796B2Sep 6, 2005
System, method and apparatus for improved global dual-damascene planarization
LAM RES CORP14 citations83
US7084621B2Aug 1, 2006
Enhancement of eddy current based measurement capabilities
LAM RES CORP10 citations74
US6951624B2Oct 4, 2005
Method and apparatus of arrayed sensors for metrological control
LAM RES CORP5 citations74
US6859765B2Feb 22, 2005
Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection
LAM RES CORP7 citations73
US6922053B2Jul 26, 2005
Complementary sensors metrological process and method and apparatus for implementing the same
LAM RES CORP2 citations63
US6894491B2May 17, 2005
Method and apparatus for metrological process control implementing complementary sensors
LAM RES CORP4 citations63
US6821899B2Nov 23, 2004
System, method and apparatus for improved local dual-damascene planarization
LAM RES CORP6 citations62
US10747210B2Aug 18, 2020
System and method for automating user interaction for semiconductor manufacturing equipment
LAM RES CORP1 citations60
US7105102B2Sep 12, 2006
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
LAM RES CORP0 citations52