Inventor
KONRATH JENS PETER
AT47 patents
⚠️ This page may combine multiple inventors who share the name “KONRATH JENS PETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
42 patentsUS10818749B2Oct 27, 2020
Semiconductor devices and a circuit for controlling a field effect transistor of a semiconductor device
INFINEON TECHNOLOGIES AG6 citations73
US9905655B2Feb 27, 2018
Method for reducing bipolar degradation in an SIC semiconductor device and semiconductor device
INFINEON TECHNOLOGIES AG2 citations73
US9859362B2Jan 2, 2018
Processing a semiconductor wafer
INFINEON TECHNOLOGIES AG2 citations73
US9859383B2Jan 2, 2018
Schottky diode with reduced forward voltage
INFINEON TECHNOLOGIES AG2 citations73
US11063142B2Jul 13, 2021
Semiconductor device including silicon carbide body and method of manufacturing
INFINEON TECHNOLOGIES AG2 citations72
US9633957B2Apr 25, 2017
Semiconductor device, a power semiconductor device, and a method for processing a semiconductor device
INFINEON TECHNOLOGIES AG3 citations72
US9595469B2Mar 14, 2017
Semiconductor device and method for producing the same
INFINEON TECHNOLOGIES AG2 citations72
US10593668B2Mar 17, 2020
Semiconductor device and corresponding manufacturing method
INFINEON TECHNOLOGIES AG2 citations71
US10566426B2Feb 18, 2020
Forming silicon oxide layers by radical oxidation and semiconductor device with silicon oxide layer
INFINEON TECHNOLOGIES AG4 citations71
US11552173B2Jan 10, 2023
Silicon carbide device with trench gate
INFINEON TECHNOLOGIES AG2 citations70
US10672661B2Jun 2, 2020
Preliminary trenches formed in kerf regions for die singulation
INFINEON TECHNOLOGIES AG2 citations68
US12107141B2Oct 1, 2024
Semiconductor device having a silicon carbide drift zone over a silicon carbide field stop zone
INFINEON TECHNOLOGIES AG0 citations62
US11302795B2Apr 12, 2022
Method of manufacturing a semiconductor device and semiconductor device
INFINEON TECHNOLOGIES AG0 citations62
US11322596B2May 3, 2022
Semiconductor device including junction material in a trench and manufacturing method
INFINEON TECHNOLOGIES AG0 citations61
US11024502B2Jun 1, 2021
Semiconductor devices and methods for forming semiconductor devices
INFINEON TECHNOLOGIES AG1 citations61
US10937784B2Mar 2, 2021
Method of manufacturing a semiconductor device
INFINEON TECHNOLOGIES AG0 citations61
US12266694B2Apr 1, 2025
Silicon carbide device with a stripe-shaped trench gate structure
INFINEON TECHNOLOGIES AG0 citations60
US11888032B2Jan 30, 2024
Method of producing a silicon carbide device with a trench gate
INFINEON TECHNOLOGIES AG0 citations60
US11380756B2Jul 5, 2022
Silicon carbide device with Schottky contact
INFINEON TECHNOLOGIES AG0 citations60
US11854926B2Dec 26, 2023
Semiconductor device with a passivation layer and method for producing thereof
INFINEON TECHNOLOGIES AG0 citations59
US11842938B2Dec 12, 2023
Semiconductor device and method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations59
US11217500B2Jan 4, 2022
Semiconductor device and method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations59
US11158557B2Oct 26, 2021
Semiconductor device with a passivation layer and method for producing thereof
INFINEON TECHNOLOGIES AG0 citations59
US11211303B2Dec 28, 2021
Semiconductor device including a passivation structure and manufacturing method
INFINEON TECHNOLOGIES AG1 citations55
US10431681B2Oct 1, 2019
Semiconductor devices and a method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations52
US10121691B2Nov 6, 2018
Semiconductor substrate arrangements and a method for forming a semiconductor substrate arrangement
INFINEON TECHNOLOGIES AG0 citations52
US10043866B2Aug 7, 2018
Semiconductor device and a method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations52
US10014383B2Jul 3, 2018
Method for manufacturing a semiconductor device comprising a metal nitride layer and semiconductor device
INFINEON TECHNOLOGIES AG0 citations52
US9911610B2Mar 6, 2018
Semiconductor device having a metal-semiconductor junction and manufacturing therefor
INFINEON TECHNOLOGIES AG0 citations52
US9711660B2Jul 18, 2017
JFET and method of manufacturing thereof
INFINEON TECHNOLOGIES AG1 citations52
US9548399B2Jan 17, 2017
Junction field effect transistor cell with lateral channel region
INFINEON TECHNOLOGIES AG1 citations52
US9508711B2Nov 29, 2016
Semiconductor device with bipolar junction transistor cells
INFINEON TECHNOLOGIES AG1 citations52
US9425327B2Aug 23, 2016
Junction field effect transistor cell with lateral channel region
INFINEON TECHNOLOGIES AG0 citations52
US9384983B2Jul 5, 2016
Method of manufacturing a vertical semiconductor device
INFINEON TECHNOLOGIES AG0 citations52
US9070790B2Jun 30, 2015
Vertical semiconductor device and method of manufacturing thereof
INFINEON TECHNOLOGIES AG0 citations52
US9997459B2Jun 12, 2018
Semiconductor device having a barrier layer made of amorphous molybdenum nitride and method for producing such a semiconductor device
INFINEON TECHNOLOGIES AG0 citations51
US9966348B2May 8, 2018
Method for processing an electronic component and an electronic component
INFINEON TECHNOLOGIES AG0 citations51
US9806041B1Oct 31, 2017
Method for processing an electronic component and an electronic component
INFINEON TECHNOLOGIES AG0 citations51
US10002930B2Jun 19, 2018
Forming a contact layer on a semiconductor body
INFINEON TECHNOLOGIES AG0 citations50
US10411097B2Sep 10, 2019
Semiconductor component having a doped substrate layer and corresponding methods of manufacturing
INFINEON TECHNOLOGIES AG0 citations41
US9859396B2Jan 2, 2018
Methods for forming a plurality of semiconductor devices on a plurality of semiconductor wafers
INFINEON TECHNOLOGIES AG0 citations40
US9685347B2Jun 20, 2017
Semiconductor device and method for producing the same
INFINEON TECHNOLOGIES AG0 citations40
INFINEON TECHNOLOGIES AUSTRIA AG
4 patentsUS11677023B2Jun 13, 2023
Semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG0 citations50
US10763339B2Sep 1, 2020
Method for manufacturing a semiconductor device having a Schottky contact
INFINEON TECHNOLOGIES AUSTRIA AG0 citations49
US10431698B2Oct 1, 2019
Semiconductor device with non-ohmic contact between SiC and a contact layer containing metal nitride
INFINEON TECHNOLOGIES AUSTRIA AG0 citations49
US10199514B2Feb 5, 2019
Methods for manufacturing a semiconductor device having a non-ohmic contact formed between a semiconductor material and an electrically conductive contact layer
INFINEON TECHNOLOGIES AUSTRIA AG0 citations49