Inventor
SUGIYAMA YASUHIKO
JP43 patents
⚠️ This page may combine multiple inventors who share the name “SUGIYAMA YASUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH SCIENCE CORP
15 patentsUS9111717B2Aug 18, 2015
Ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP7 citations84
US8764994B2Jul 1, 2014
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP4 citations72
US8822911B2Sep 2, 2014
Focused ion beam apparatus and method of adjusting ion beam optics
HITACHI HIGH TECH SCIENCE CORP3 citations63
US11257655B2Feb 22, 2022
Focused ion beam apparatus, and control method for focused ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations62
US9378858B2Jun 28, 2016
Repair apparatus
HITACHI HIGH TECH SCIENCE CORP2 citations62
US9129771B2Sep 8, 2015
Emitter structure, gas ion source and focused ion beam system
HITACHI HIGH TECH SCIENCE CORP2 citations62
US10176964B2Jan 8, 2019
Focused ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations52
US10056232B2Aug 21, 2018
Charged particle beam apparatus and plasma ignition method
HITACHI HIGH TECH SCIENCE CORP1 citations52
US11017982B2May 25, 2021
Composite charged particle beam apparatus and control method thereof
HITACHI HIGH TECH SCIENCE CORP0 citations51
US9336979B2May 10, 2016
Focused ion beam apparatus with precious metal emitter surface
HITACHI HIGH TECH SCIENCE CORP1 citations51
US8999178B2Apr 7, 2015
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP0 citations51
US11721517B2Aug 8, 2023
Focused ion beam processing apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations49
US11276555B2Mar 15, 2022
Charged particle beam apparatus, composite charged particle beam apparatus, and control method for charged particle beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations47
US11017988B2May 25, 2021
Charged particle beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations47
US9245712B2Jan 26, 2016
Focused ion beam system
HITACHI HIGH TECH SCIENCE CORP0 citations41
SEIKO INSTR INC
12 patentsUS6437330B1Aug 20, 2002
Method and apparatus for adjusting a charged particle beam of a beam optical system
SEIKO INSTR INC20 citations92
US6300628B1Oct 9, 2001
Focused ion beam machining method and device thereof
SEIKO INSTR INC23 citations92
US6118122ASep 12, 2000
Ion beam working apparatus
SEIKO INSTR INC21 citations92
US5969355AOct 19, 1999
Focused ion beam optical axis adjustment method and focused ion beam apparatus
SEIKO INSTR INC26 citations89
US6177670B1Jan 23, 2001
Method of observing secondary ion image by focused ion beam
SEIKO INSTR INC18 citations84
US6384418B1May 7, 2002
Sample transfer apparatus and sample stage
SEIKO INSTR INC12 citations74
US6331712B1Dec 18, 2001
Section formation observing method
SEIKO INSTR INC9 citations74
US5917186AJun 29, 1999
Focused ion beam optical axis adjustment method and focused ion beam apparatus
SEIKO INSTR INC8 citations74
US6472881B1Oct 29, 2002
Liquid metal ion source and method for measuring flow impedance of liquid metal ion source
SEIKO INSTR INC9 citations73
US6281496B1Aug 28, 2001
Observing/forming method with focused ion beam and apparatus therefor
SEIKO INSTR INC10 citations73
US5438197AAug 1, 1995
Focused ion beam apparatus
SEIKO INSTR INC4 citations63
US6489612B1Dec 3, 2002
Method of measuring film thickness
SEIKO INSTR INC5 citations61
SII NANOTECHNOLOGY INC
6 patentsUS6870161B2Mar 22, 2005
Apparatus for processing and observing a sample
SII NANOTECHNOLOGY INC23 citations92
US6838685B1Jan 4, 2005
Ion beam apparatus, ion beam processing method and sample holder member
SII NANOTECHNOLOGY INC26 citations91
US7172839B2Feb 6, 2007
Photomask correction method using composite charged particle beam, and device used in the correction method
SII NANOTECHNOLOGY INC10 citations84
US7297944B2Nov 20, 2007
Ion beam device and ion beam processing method, and holder member
SII NANOTECHNOLOGY INC9 citations70
US7276691B2Oct 2, 2007
Ion beam device and ion beam processing method
SII NANOTECHNOLOGY INC6 citations61
US7576340B2Aug 18, 2009
Focused ion beam processing method
SII NANOTECHNOLOGY INC0 citations51
HITACHI HIGH-TECH SCIENCE CORP
5 patentsUS9773634B2Sep 26, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP2 citations72
US9418817B2Aug 16, 2016
Focused ion beam apparatus and control method thereof
HITACHI HIGH-TECH SCIENCE CORP2 citations62
US9640361B2May 2, 2017
Emitter structure, gas ion source and focused ion beam system
HITACHI HIGH-TECH SCIENCE CORP0 citations52
US9793085B2Oct 17, 2017
Focused ion beam apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
US9583299B2Feb 28, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
KAITO TAKASHI
2 patentsUS8274063B2Sep 25, 2012
Composite focused ion beam device, process observation method using the same, and processing method
KAITO TAKASHI4 citations60
US8269194B2Sep 18, 2012
Composite focused ion beam device, and processing observation method and processing method using the same
KAITO TAKASHI3 citations60