Inventor

MATSUDA NOBUAKI

JP3 patents

Patents

3 patents

US5756267AMay 26, 1998

Developing solution for negative type photosensitive resin compositions

FUJI PHOTO FILM CO LTD41 citations89

US4842986AJun 27, 1989

Positively working resist material

FUJI PHOTO FILM CO LTD7 citations72

US5308743AMay 3, 1994

Positive image-forming process utilizing glass substrate with oxide film of indium-tin alloy, coated with o-quinonediazide photoresist, with etching of the oxide film in the imagewise exposed areas

FUJI PHOTO FILM CO LTD6 citations60