Inventor
BRUNSVOLD WILLIAM R
US16 patents
⚠️ This page may combine multiple inventors who share the name “BRUNSVOLD WILLIAM R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
14 patentsUS6057080AMay 2, 2000
Top antireflective coating film
IBM86 citations96
US5744537AApr 28, 1998
Antireflective coating films
IBM72 citations96
US5609989AMar 11, 1997
Acid scavengers for use in chemically amplified photoresists
IBM47 citations94
US5272042ADec 21, 1993
Positive photoresist system for near-UV to visible imaging
IBM68 citations94
US6818381B2Nov 16, 2004
Underlayer compositions for multilayer lithographic processes
IBM21 citations92
US5164278ANov 17, 1992
Speed enhancers for acid sensitized resists
IBM41 citations92
US5338818AAug 16, 1994
Silicon containing positive resist for DUV lithography
IBM44 citations91
US4931379AJun 5, 1990
High sensitivity resists having autodecomposition temperatures greater than about 160° C.
IBM30 citations91
US5023164AJun 11, 1991
Highly sensitive dry developable deep UV photoresist
IBM26 citations90
US6372406B1Apr 16, 2002
Deactivated aromatic amines as additives in acid-catalyzed resists
IBM10 citations74
US6927015B2Aug 9, 2005
Underlayer compositions for multilayer lithographic processes
IBM10 citations73
US4828964AMay 9, 1989
Polyimide formulation for forming a patterned film on a substrate
IBM7 citations67
US5567569AOct 22, 1996
Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring
IBM4 citations61
US5552256ASep 3, 1996
Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
IBM2 citations61