Inventor
CZECH GUENTHER
DE8 patents
⚠️ This page may combine multiple inventors who share the name “CZECH GUENTHER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
6 patentsUS6686098B2Feb 3, 2004
Lithography method and lithography mask
INFINEON TECHNOLOGIES AG19 citations88
US7011936B2Mar 14, 2006
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools
INFINEON TECHNOLOGIES AG13 citations82
US7368390B2May 6, 2008
Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process
INFINEON TECHNOLOGIES AG6 citations61
US6800407B2Oct 5, 2004
Method for experimentally verifying imaging errors in photomasks
INFINEON TECHNOLOGIES AG2 citations61
US6696208B2Feb 24, 2004
Method for experimentally verifying imaging errors in optical exposure units
INFINEON TECHNOLOGIES AG4 citations61
US6620559B2Sep 16, 2003
Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements
INFINEON TECHNOLOGIES AG3 citations59