Inventor
BIJKERK FREDERIK
NL16 patents
⚠️ This page may combine multiple inventors who share the name “BIJKERK FREDERIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
6 patentsUS9442383B2Sep 13, 2016
EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method
ZEISS CARL SMT GMBH3 citations69
US8638494B2Jan 28, 2014
Reflective optical element and method of manufacturing the same
ZEISS CARL SMT GMBH2 citations57
US11360393B2Jun 14, 2022
Mirror, in particular for a microlithographic projection exposure system
ZEISS CARL SMT GMBH1 citations56
US10916356B2Feb 9, 2021
Reflective optical element
ZEISS CARL SMT GMBH0 citations49
US9997268B2Jun 12, 2018
EUV-mirror, optical system with EUV-mirror and associated operating method
ZEISS CARL SMT GMBH1 citations48
US9733580B2Aug 15, 2017
Method for producing a reflective optical element for EUV-lithography
ZEISS CARL SMT GMBH0 citations36
ASML NETHERLANDS BV
5 patentsUS6452194B2Sep 17, 2002
Radiation source for use in lithographic projection apparatus
ASML NETHERLANDS BV88 citations92
US6469310B1Oct 22, 2002
Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
ASML NETHERLANDS BV28 citations88
US6818912B2Nov 16, 2004
Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV5 citations71
US6667484B2Dec 23, 2003
Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV9 citations71
USRE41362EJun 1, 2010
Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV3 citations60
ZEISS CARL SMT AG
2 patentsUS7172788B2Feb 6, 2007
Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device
ZEISS CARL SMT AG19 citations89
US7261957B2Aug 28, 2007
Multilayer system with protecting layer system and production method
ZEISS CARL SMT AG21 citations86