Inventor

GRONHEID ROEL

BE21 patents

⚠️ This page may combine multiple inventors who share the name “GRONHEID ROEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GRONHEID ROEL

IMEC VZW

Method for producing fin structures of a semiconductor device in a substrate

Method for manufacturing a mask

Quality assessment of directed self-assembling method

Method for producing fin structures of a semiconductor device in a substrate

Lithographic mask layer

Selective fin cut

KLA CORP

System and method for mitigating overlay distortion patterns caused by a wafer bonding tool

System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target

System and method for mitigating overlay distortion patterns caused by a wafer bonding tool

Inspection sensitivity improvements for optical and electron beam inspection

System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target

3D profilometry with a Linnik interferometer

ASM IP HOLDING BV

Combined anneal and selective deposition process

Combined anneal and selective deposition process

Method of forming a directed self-assembled layer on a substrate

KLA TENCOR CORP

Determining the impacts of stochastic behavior on overlay metrology data

Reduction or elimination of pattern placement error in metrology measurements

Reduction or elimination of pattern placement error in metrology measurements

IMEC

Methods and devices for lithography using electromagnetic radiation with short wavelengths

Conformal anti-reflective coating

GRONHEID ROEL

Method of process optimization for dual tone development