Inventor
FREIMANN ROLF
DE41 patents
⚠️ This page may combine multiple inventors who share the name “FREIMANN ROLF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
21 patentsUS8345262B2Jan 1, 2013
Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface
ZEISS CARL SMT GMBH8 citations82
US10101667B2Oct 16, 2018
Method for aligning a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9575224B2Feb 21, 2017
Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
ZEISS CARL SMT GMBH3 citations70
US9377694B2Jun 28, 2016
Projection arrangement
ZEISS CARL SMT GMBH2 citations63
US10948833B2Mar 16, 2021
Wafer holding device and projection microlithography system
ZEISS CARL SMT GMBH0 citations62
US12346033B2Jul 1, 2025
Optical system
ZEISS CARL SMT GMBH0 citations60
US10386733B2Aug 20, 2019
Optical system
ZEISS CARL SMT GMBH1 citations60
US11892283B2Feb 6, 2024
Measuring apparatus for interferometrically determining a surface shape
ZEISS CARL SMT GMBH0 citations52
US11426067B2Aug 30, 2022
Method and assembly for analysing the wavefront effect of an optical system
ZEISS CARL SMT GMBH0 citations52
US10359703B2Jul 23, 2019
Method for aligning a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9996014B2Jun 12, 2018
Optical imaging device with image defect determination
ZEISS CARL SMT GMBH0 citations52
US9568394B2Feb 14, 2017
Optical device
ZEISS CARL SMT GMBH1 citations52
US9235131B2Jan 12, 2016
Optical imaging device with image defect determination
ZEISS CARL SMT GMBH0 citations52
US8822942B2Sep 2, 2014
Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area
ZEISS CARL SMT GMBH0 citations52
US8541752B2Sep 24, 2013
Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
ZEISS CARL SMT GMBH0 citations52
US9720329B2Aug 1, 2017
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US10345547B2Jul 9, 2019
Method for producing a lens for a lithography apparatus, and measurement system
ZEISS CARL SMT GMBH0 citations50
US10042271B2Aug 7, 2018
Projection exposure system for microlithography with a measurement device
ZEISS CARL SMT GMBH0 citations50
US9696639B2Jul 4, 2017
Projection exposure system for microlithography with a measurement device
ZEISS CARL SMT GMBH0 citations50
US9482968B2Nov 1, 2016
Measuring system
ZEISS CARL SMT GMBH0 citations50
US10754132B2Aug 25, 2020
Imaging optical system for microlithography
ZEISS CARL SMT GMBH0 citations41
ZEISS CARL SMT AG
11 patentsUS7190527B2Mar 13, 2007
Refractive projection objective
ZEISS CARL SMT AG161 citations99
US7382540B2Jun 3, 2008
Refractive projection objective
ZEISS CARL SMT AG105 citations98
US7050175B1May 23, 2006
Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surface
ZEISS CARL SMT AG24 citations92
US6940607B2Sep 6, 2005
Method for absolute calibration of an interferometer
ZEISS CARL SMT AG19 citations89
US7643149B2Jan 5, 2010
Method of aligning an optical system
ZEISS CARL SMT AG16 citations80
US7133225B1Nov 7, 2006
Method of manufacturing an optical system
ZEISS CARL SMT AG7 citations67
US7403290B1Jul 22, 2008
Method and means for determining the shape of a rough surface of an object
ZEISS CARL SMT AG5 citations63
US7154612B2Dec 26, 2006
Method for calibrating a radius test bench
ZEISS CARL SMT AG3 citations63
US7342667B1Mar 11, 2008
Method of processing an optical element using an interferometer having an aspherical lens that transforms a first spherical beam type into a second spherical beam type
ZEISS CARL SMT AG6 citations62
US7581305B2Sep 1, 2009
Method of manufacturing an optical component
ZEISS CARL SMT AG2 citations61
US7508488B2Mar 24, 2009
Projection exposure system and method of manufacturing a miniaturized device
ZEISS CARL SMT AG5 citations59
FREIMANN ROLF
5 patentsUS8908149B2Dec 9, 2014
Projection exposure system and use thereof
FREIMANN ROLF15 citations83
US8228485B2Jul 24, 2012
Projection illumination system
FREIMANN ROLF7 citations75
US8537333B2Sep 17, 2013
Optical imaging device with image defect determination
FREIMANN ROLF2 citations62
US8537332B2Sep 17, 2013
Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution
FREIMANN ROLF2 citations62
US8593642B2Nov 26, 2013
Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
FREIMANN ROLF2 citations57