P

Inventor

FREIMANN ROLF

DE41 patents
⚠️ This page may combine multiple inventors who share the name “FREIMANN ROLF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

21 patents
US8345262B2Jan 1, 2013

Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface

ZEISS CARL SMT GMBH8 citations82
US10101667B2Oct 16, 2018

Method for aligning a mirror of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH2 citations73
US9575224B2Feb 21, 2017

Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective

ZEISS CARL SMT GMBH3 citations70
US9377694B2Jun 28, 2016

Projection arrangement

ZEISS CARL SMT GMBH2 citations63
US10948833B2Mar 16, 2021

Wafer holding device and projection microlithography system

ZEISS CARL SMT GMBH0 citations62
US12346033B2Jul 1, 2025

Optical system

ZEISS CARL SMT GMBH0 citations60
US10386733B2Aug 20, 2019

Optical system

ZEISS CARL SMT GMBH1 citations60
US11892283B2Feb 6, 2024

Measuring apparatus for interferometrically determining a surface shape

ZEISS CARL SMT GMBH0 citations52
US11426067B2Aug 30, 2022

Method and assembly for analysing the wavefront effect of an optical system

ZEISS CARL SMT GMBH0 citations52
US10359703B2Jul 23, 2019

Method for aligning a mirror of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations52
US9996014B2Jun 12, 2018

Optical imaging device with image defect determination

ZEISS CARL SMT GMBH0 citations52
US9568394B2Feb 14, 2017

Optical device

ZEISS CARL SMT GMBH1 citations52
US9235131B2Jan 12, 2016

Optical imaging device with image defect determination

ZEISS CARL SMT GMBH0 citations52
US8822942B2Sep 2, 2014

Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area

ZEISS CARL SMT GMBH0 citations52
US8541752B2Sep 24, 2013

Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask

ZEISS CARL SMT GMBH0 citations52
US9720329B2Aug 1, 2017

Projection objective of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH1 citations51
US10345547B2Jul 9, 2019

Method for producing a lens for a lithography apparatus, and measurement system

ZEISS CARL SMT GMBH0 citations50
US10042271B2Aug 7, 2018

Projection exposure system for microlithography with a measurement device

ZEISS CARL SMT GMBH0 citations50
US9696639B2Jul 4, 2017

Projection exposure system for microlithography with a measurement device

ZEISS CARL SMT GMBH0 citations50
US9482968B2Nov 1, 2016

Measuring system

ZEISS CARL SMT GMBH0 citations50
US10754132B2Aug 25, 2020

Imaging optical system for microlithography

ZEISS CARL SMT GMBH0 citations41

ZEISS CARL SMT AG

11 patents

FREIMANN ROLF

5 patents

HETZLER JOCHEN

1 patent

SCHILLKE FRANK

1 patent

MUELLER ULRICH

1 patent

HOF ALBRECHT

1 patent