Inventor
HETZLER JOCHEN
DE28 patents
⚠️ This page may combine multiple inventors who share the name “HETZLER JOCHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
19 patentsUS9442393B2Sep 13, 2016
Projection exposure tool for microlithography and method for microlithographic imaging
ZEISS CARL SMT GMBH5 citations84
US9046792B2Jun 2, 2015
Projection exposure tool for microlithography and method for microlithographic imaging
ZEISS CARL SMT GMBH6 citations84
US10337850B2Jul 2, 2019
Interferometric measuring arrangement
ZEISS CARL SMT GMBH10 citations82
US10527403B2Jan 7, 2020
Measuring device for interferometric determination of a shape of an optical surface
ZEISS CARL SMT GMBH3 citations73
US10101667B2Oct 16, 2018
Method for aligning a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9709902B2Jul 18, 2017
Projection exposure tool for microlithography and method for microlithographic imaging
ZEISS CARL SMT GMBH2 citations73
US10502545B2Dec 10, 2019
Measuring method and measuring arrangement for an imaging optical system
ZEISS CARL SMT GMBH4 citations72
US11774237B2Oct 3, 2023
Method for calibrating a measuring apparatus
ZEISS CARL SMT GMBH3 citations71
US10422718B2Sep 24, 2019
Test device and method for testing a mirror
ZEISS CARL SMT GMBH2 citations70
US12571985B2Mar 10, 2026
Measuring device for interferometric shape measurement
ZEISS CARL SMT GMBH0 citations62
US12105427B2Oct 1, 2024
Method and device for correcting a telecentricity error of an imaging device
ZEISS CARL SMT GMBH0 citations54
US11879720B2Jan 23, 2024
Device and method for characterizing the surface shape of a test object
ZEISS CARL SMT GMBH0 citations52
US11199396B2Dec 14, 2021
Compensation optical system for an interferometric measuring system
ZEISS CARL SMT GMBH0 citations52
US10359703B2Jul 23, 2019
Method for aligning a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US10303068B2May 28, 2019
Projection exposure tool for microlithography and method for microlithographic imaging
ZEISS CARL SMT GMBH0 citations52
US10054426B2Aug 21, 2018
Mask inspection system for inspecting lithography masks
ZEISS CARL SMT GMBH0 citations51
US9052606B2Jun 9, 2015
Microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US12332043B2Jun 17, 2025
Measurement method for interferometrically determining a surface shape
ZEISS CARL SMT GMBH0 citations49
US12235097B2Feb 25, 2025
Diffractive optical element for a test interferometer
ZEISS CARL SMT GMBH0 citations46
ZEISS CARL SMT AG
3 patentsUS7605926B1Oct 20, 2009
Optical system, method of manufacturing an optical system and method of manufacturing an optical element
ZEISS CARL SMT AG47 citations92
US7061626B1Jun 13, 2006
Method of manufacturing an optical element using a hologram
ZEISS CARL SMT AG29 citations92
US7848031B2Dec 7, 2010
Hologram and method of manufacturing an optical element using a hologram
ZEISS CARL SMT AG11 citations84
HETZLER JOCHEN
2 patentsUS8089634B2Jan 3, 2012
Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure
HETZLER JOCHEN4 citations71
US9606339B2Mar 28, 2017
Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus
HETZLER JOCHEN1 citations50