Inventor

HARAFUJI KENJI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “HARAFUJI KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HARAFUJI KENJI

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Plasma treatment method and plasma treatment system

Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light

Scanning electron microscope and a method of displaying cross sectional profiles using the same

Method of fabricating nitride semiconductor device

Bipolar transistor and semiconductor device

Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device

Semiconductor laser device

Method and apparatus for generating highly dense uniform plasma in a high frequency electric field

Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field

Drying etching method

Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device

Method of fabricating nitride semiconductor device

Method and apparatus for depositing semiconductor film and method for fabricating semiconductor device

Plasma generating and processing method and apparatus thereof

Dry etching Method

Dry etching method and dry etching apparatus

Electron beam exposure evaluation method

Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device

MATSUSHITA ELECTRIC COMPANY LT

Plasma generating method and apparatus

HARAFUJI KENJI

Semiconductor device