Inventor
LAUTER MICHAEL
DE24 patents
⚠️ This page may combine multiple inventors who share the name “LAUTER MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BASF SE
18 patentsUS10647900B2May 12, 2020
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors
BASF SE3 citations72
US11264250B2Mar 1, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE2 citations71
US10899945B2Jan 26, 2021
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
BASF SE3 citations71
US10385236B2Aug 20, 2019
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE5 citations71
US9777192B2Oct 3, 2017
Chemical mechanical polishing (CMP) composition comprising a protein
BASF SE3 citations71
US11168239B2Nov 9, 2021
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors
BASF SE0 citations61
US11286402B2Mar 29, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations60
US8980750B2Mar 17, 2015
Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt
BASF SE2 citations59
US10738219B2Aug 11, 2020
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations50
US10570316B2Feb 25, 2020
Chemical mechanical polishing (CMP) composition
BASF SE0 citations50
US12378439B2Aug 5, 2025
Compositions for tungsten etching inhibition
BASF SE0 citations49
US12351737B2Jul 8, 2025
Chemical mechanical polishing of substrates containing copper and ruthenium
BASF SE0 citations49
US11993729B2May 28, 2024
Chemical mechanical polishing composition
BASF SE0 citations49
US11725117B2Aug 15, 2023
Chemical mechanical polishing of substrates containing copper and ruthenium
BASF SE0 citations49
US10844325B2Nov 24, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations48
US10865361B2Dec 15, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations47
US10844333B2Nov 24, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations36
US10227506B2Mar 12, 2019
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium
BASF SE0 citations34