Inventor

CHENG MENG-HSUM

TW3 patents

Patents

3 patents

US6639035B1Oct 28, 2003

Polymer for chemical amplified photoresist compositions

EVERLIGHT USA INC28 citations90

US6703178B2Mar 9, 2004

Chemical amplified photoresist compositions

EVERLIGHT USA INC16 citations81

US6720430B2Apr 13, 2004

Monomer for chemical amplified photoresist compositions

EVERLIGHT USA INC12 citations71