Inventor
IRIE MAKIKO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “IRIE MAKIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
12 patentsUS7494762B2Feb 24, 2009
Positive resist composition for immersion lithography and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD8 citations83
US8795947B2Aug 5, 2014
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations73
US7799507B2Sep 21, 2010
Positive resist composition for immersion lithography and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US7781144B2Aug 24, 2010
Positive resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD5 citations61
US9448478B2Sep 20, 2016
Chemically amplified positive-type photosensitive resin composition for thick-film application
TOKYO OHKA KOGYO CO LTD2 citations59
US9323152B2Apr 26, 2016
Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same
TOKYO OHKA KOGYO CO LTD1 citations51
US8021824B2Sep 20, 2011
Polymer compound, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD1 citations51
US9372403B2Jun 21, 2016
Chemically amplified photosensitive resin composition and method for producing resist pattern using the same
TOKYO OHKA KOGYO CO LTD0 citations49
US8029968B2Oct 4, 2011
Positive resist composition and method for resist pattern formation
TOKYO OHKA KOGYO CO LTD0 citations41
US7858288B2Dec 28, 2010
Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
TOKYO OHKA KOGYO CO LTD0 citations41
US7858286B2Dec 28, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
US10261415B2Apr 16, 2019
Chemically amplified positive-type photosensitive resin composition
TOKYO OHKA KOGYO CO LTD0 citations36
IRIE MAKIKO
5 patentsUS8263307B2Sep 11, 2012
Positive resist composition and method of forming resist pattern
IRIE MAKIKO7 citations82
US8192914B2Jun 5, 2012
Resist composition for immersion exposure and method of forming resist pattern
IRIE MAKIKO4 citations60
US8916332B2Dec 23, 2014
Resist composition, method of forming resist pattern, and polymeric compound
IRIE MAKIKO0 citations50
US8574813B2Nov 5, 2013
Resist composition for immersion exposure and method of forming resist pattern
IRIE MAKIKO1 citations50
US8394569B2Mar 12, 2013
Resist composition for immersion lithography and method for forming resist pattern
IRIE MAKIKO0 citations40