Inventor
SEKI MASAYA
JP53 patents
⚠️ This page may combine multiple inventors who share the name “SEKI MASAYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
36 patentsUS9248545B2Feb 2, 2016
Substrate processing apparatus and substrate processing method
EBARA CORP7 citations84
US8047896B2Nov 1, 2011
Polishing apparatus, polishing method, and processing apparatus
EBARA CORP11 citations84
US7976361B2Jul 12, 2011
Polishing apparatus and polishing method
EBARA CORP8 citations84
US8029333B2Oct 4, 2011
Device for polishing peripheral edge of semiconductor wafer
EBARA CORP11 citations83
US6824613B2Nov 30, 2004
Substrate processing apparatus
EBARA CORP16 citations82
US7578886B2Aug 25, 2009
Substrate processing apparatus, substrate processing method, and substrate holding apparatus
EBARA CORP14 citations81
US10343252B2Jul 9, 2019
Polishing apparatus for detecting abnormality in polishing of a substrate
EBARA CORP4 citations73
US10166647B2Jan 1, 2019
Polishing apparatus and polishing method
EBARA CORP2 citations73
US10155294B2Dec 18, 2018
Polishing apparatus and polishing method
EBARA CORP2 citations73
US9914196B2Mar 13, 2018
Polishing apparatus and polishing method
EBARA CORP2 citations73
US9782869B2Oct 10, 2017
Apparatus for detecting abnormality in polishing of a substrate
EBARA CORP2 citations73
US9694467B2Jul 4, 2017
Polishing method of polishing a substrate
EBARA CORP2 citations73
US9561573B2Feb 7, 2017
Polishing apparatus
EBARA CORP3 citations73
US9248543B2Feb 2, 2016
Method of detecting abnormality in polishing of a substrate and polishing apparatus
EBARA CORP3 citations73
US8748289B2Jun 10, 2014
Method for manufacturing semiconductor device
EBARA CORP5 citations73
US10414013B2Sep 17, 2019
Polishing method and polishing apparatus
EBARA CORP2 citations72
US10403505B2Sep 3, 2019
Substrate processing method and substrate processing apparatus
EBARA CORP5 citations72
US10144103B2Dec 4, 2018
Polishing apparatus and polishing method
EBARA CORP3 citations72
US10137552B2Nov 27, 2018
Polishing apparatus
EBARA CORP2 citations72
US9649739B2May 16, 2017
Polishing apparatus
EBARA CORP2 citations72
US11833551B2Dec 5, 2023
Pre-wet module, deaerated liquid circulation system, and pre-wet method
EBARA CORP2 citations68
US9517544B2Dec 13, 2016
Polishing apparatus and polishing method
EBARA CORP2 citations63
US9457448B2Oct 4, 2016
Polishing apparatus and polishing method
EBARA CORP2 citations63
US12359339B2Jul 15, 2025
Plating apparatus and substrate holder operation method
EBARA CORP0 citations62
US12270120B2Apr 8, 2025
Plating apparatus and plating method
EBARA CORP0 citations62
US11511386B2Nov 29, 2022
Polishing apparatus and polishing method
EBARA CORP0 citations62
US11230789B2Jan 25, 2022
Method of removing liquid from seal of a substrate holder
EBARA CORP0 citations62
US12076760B2Sep 3, 2024
Pre-wet module, deaerated liquid circulation system, and pre-wet method
EBARA CORP0 citations58
US12347697B2Jul 1, 2025
Prewet module and prewet method
EBARA CORP0 citations52
US11535949B2Dec 27, 2022
Substrate holder and plating apparatus
EBARA CORP0 citations52
US10493588B2Dec 3, 2019
Polishing apparatus and polishing method
EBARA CORP0 citations52
US12247311B2Mar 11, 2025
Plating apparatus and plating process method
EBARA CORP0 citations51
US12180606B2Dec 31, 2024
Plating apparatus
EBARA CORP0 citations51
US12152311B2Nov 26, 2024
Wetting method for substrate and plating apparatus
EBARA CORP0 citations51
US12134833B2Nov 5, 2024
Plating apparatus and cleaning method of contact member of plating apparatus
EBARA CORP0 citations51
US12054840B2Aug 6, 2024
Plating apparatus, pre-wet process method, and cleaning process method
EBARA CORP0 citations51
TAKAHASHI TAMAMI
4 patentsUS9287158B2Mar 15, 2016
Substrate processing apparatus
TAKAHASHI TAMAMI7 citations84
US8187055B2May 29, 2012
Polishing apparatus and polishing method
TAKAHASHI TAMAMI11 citations83
US8506363B2Aug 13, 2013
Substrate holder and substrate holding method
TAKAHASHI TAMAMI6 citations72
US8986069B2Mar 24, 2015
Polishing apparatus and polishing method
TAKAHASHI TAMAMI2 citations62
NAKANISHI MASAYUKI
4 patentsUS8641480B2Feb 4, 2014
Polishing apparatus and polishing method
NAKANISHI MASAYUKI10 citations83
US8445360B2May 21, 2013
Method for manufacturing semiconductor device
NAKANISHI MASAYUKI5 citations83
US8926402B2Jan 6, 2015
Method of polishing a substrate using a polishing tape having fixed abrasive
NAKANISHI MASAYUKI6 citations72
US8535117B2Sep 17, 2013
Method and apparatus for polishing a substrate having a grinded back surface
NAKANISHI MASAYUKI5 citations67
SEKI MASAYA
3 patentsUS8979615B2Mar 17, 2015
Polishing apparatus and polishing method
SEKI MASAYA8 citations83
US9457447B2Oct 4, 2016
Polishing apparatus and polishing method
SEKI MASAYA5 citations72
US9199352B2Dec 1, 2015
Polishing apparatus, polishing method and pressing member for pressing a polishing tool
SEKI MASAYA4 citations72
NICHIAS CORP
1 patentKIMURA NORIO
1 patentMAEDA KAZUAKI
1 patentShowing the top 50 of 53 patents by PatentIndex Score.